JPS6025254A - 集積回路の製造方法 - Google Patents
集積回路の製造方法Info
- Publication number
- JPS6025254A JPS6025254A JP58133329A JP13332983A JPS6025254A JP S6025254 A JPS6025254 A JP S6025254A JP 58133329 A JP58133329 A JP 58133329A JP 13332983 A JP13332983 A JP 13332983A JP S6025254 A JPS6025254 A JP S6025254A
- Authority
- JP
- Japan
- Prior art keywords
- wiring
- silicon
- insulating film
- oxide film
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/63—Vertical IGFETs
Landscapes
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58133329A JPS6025254A (ja) | 1983-07-21 | 1983-07-21 | 集積回路の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58133329A JPS6025254A (ja) | 1983-07-21 | 1983-07-21 | 集積回路の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6025254A true JPS6025254A (ja) | 1985-02-08 |
| JPH0582071B2 JPH0582071B2 (enExample) | 1993-11-17 |
Family
ID=15102164
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58133329A Granted JPS6025254A (ja) | 1983-07-21 | 1983-07-21 | 集積回路の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6025254A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09321289A (ja) * | 1996-05-30 | 1997-12-12 | Nec Yamagata Ltd | 縦型電界効果トランジスタ |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57128966A (en) * | 1981-02-02 | 1982-08-10 | Seiko Epson Corp | Mis type semiconductor device |
-
1983
- 1983-07-21 JP JP58133329A patent/JPS6025254A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57128966A (en) * | 1981-02-02 | 1982-08-10 | Seiko Epson Corp | Mis type semiconductor device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09321289A (ja) * | 1996-05-30 | 1997-12-12 | Nec Yamagata Ltd | 縦型電界効果トランジスタ |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0582071B2 (enExample) | 1993-11-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR960001602B1 (ko) | 집적회로 제조방법 | |
| US4337476A (en) | Silicon rich refractory silicides as gate metal | |
| US4332839A (en) | Method for making integrated semiconductor circuit structure with formation of Ti or Ta silicide | |
| US4769687A (en) | Lateral bipolar transistor and method of producing the same | |
| JPS6260812B2 (enExample) | ||
| JPS6321351B2 (enExample) | ||
| JPH0586663B2 (enExample) | ||
| USRE32207E (en) | Method for making integrated semiconductor circuit structure with formation of Ti or Ta silicide | |
| KR940001505B1 (ko) | 반도체장치 | |
| US4216573A (en) | Three mask process for making field effect transistors | |
| JPS6025254A (ja) | 集積回路の製造方法 | |
| JPS6242391B2 (enExample) | ||
| JPS62131573A (ja) | 半導体装置 | |
| JPS58170030A (ja) | 半導体装置の製造方法 | |
| JPS60236257A (ja) | 半導体装置 | |
| JPS58197882A (ja) | 半導体装置の製造方法 | |
| JPH0365654B2 (enExample) | ||
| JPS6022828B2 (ja) | 半導体装置の製造方法 | |
| JPS6025272A (ja) | 絶縁ゲ−ト電界効果型トランジスタ | |
| JPS6333305B2 (enExample) | ||
| JPH0582066B2 (enExample) | ||
| JPH01304781A (ja) | 半導体装置の製造方法 | |
| JPS5897869A (ja) | 半導体装置の製造方法 | |
| JPS5947768A (ja) | 半導体装置及びその製造方法 | |
| JPS5814572A (ja) | 半導体装置の製造方法 |