JPS6025252A - 半導体装置 - Google Patents

半導体装置

Info

Publication number
JPS6025252A
JPS6025252A JP13330983A JP13330983A JPS6025252A JP S6025252 A JPS6025252 A JP S6025252A JP 13330983 A JP13330983 A JP 13330983A JP 13330983 A JP13330983 A JP 13330983A JP S6025252 A JPS6025252 A JP S6025252A
Authority
JP
Japan
Prior art keywords
layer
wiring
insulating film
barrier metal
metal layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13330983A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0458185B2 (enrdf_load_stackoverflow
Inventor
Shoichi Sasaki
正一 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP13330983A priority Critical patent/JPS6025252A/ja
Publication of JPS6025252A publication Critical patent/JPS6025252A/ja
Publication of JPH0458185B2 publication Critical patent/JPH0458185B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP13330983A 1983-07-21 1983-07-21 半導体装置 Granted JPS6025252A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13330983A JPS6025252A (ja) 1983-07-21 1983-07-21 半導体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13330983A JPS6025252A (ja) 1983-07-21 1983-07-21 半導体装置

Publications (2)

Publication Number Publication Date
JPS6025252A true JPS6025252A (ja) 1985-02-08
JPH0458185B2 JPH0458185B2 (enrdf_load_stackoverflow) 1992-09-16

Family

ID=15101654

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13330983A Granted JPS6025252A (ja) 1983-07-21 1983-07-21 半導体装置

Country Status (1)

Country Link
JP (1) JPS6025252A (enrdf_load_stackoverflow)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5137579A (ja) * 1974-09-25 1976-03-29 Suwa Seikosha Kk Handotaisochi
JPS55137561U (enrdf_load_stackoverflow) * 1979-03-20 1980-09-30

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5137579A (ja) * 1974-09-25 1976-03-29 Suwa Seikosha Kk Handotaisochi
JPS55137561U (enrdf_load_stackoverflow) * 1979-03-20 1980-09-30

Also Published As

Publication number Publication date
JPH0458185B2 (enrdf_load_stackoverflow) 1992-09-16

Similar Documents

Publication Publication Date Title
JPS6025252A (ja) 半導体装置
JPH079935B2 (ja) 半導体装置
JPH02111052A (ja) 多層配線形成法
JPS62136857A (ja) 半導体装置の製造方法
JPH0570301B2 (enrdf_load_stackoverflow)
JPS63107043A (ja) 半導体装置の導電線路の形成方法
JPH01264239A (ja) 半導体装置の製造方法
JPS63161646A (ja) 半導体装置の製造方法
JPS63287034A (ja) 半導体装置
JP2551077B2 (ja) 半導体集積回路装置
JPH02183536A (ja) 半導体装置
JPH0234929A (ja) 半導体装置の製造方法
JPH02113553A (ja) 半導体集積回路の製造方法
JPH0319225A (ja) 多層配線の形成方法
JPS62115746A (ja) 半導体集積回路装置
JPS60192348A (ja) 半導体集積回路の多層配線の形成方法
JPH01194334A (ja) 半導体集積回路の製造方法
JPS62293644A (ja) 半導体装置の製造方法
JPS63308346A (ja) 半導体装置
JPS6365643A (ja) 半導体装置の製造方法
JPS63312658A (ja) 半導体装置の製造方法
JPS62145842A (ja) 半導体装置の製造方法
JPS6146973B2 (enrdf_load_stackoverflow)
JPS5976447A (ja) 多層配線方法
JPS6050943A (ja) 半導体装置