JPS60242671A - ヘテロ接合バイポ−ラトランジスタ - Google Patents
ヘテロ接合バイポ−ラトランジスタInfo
- Publication number
- JPS60242671A JPS60242671A JP59098091A JP9809184A JPS60242671A JP S60242671 A JPS60242671 A JP S60242671A JP 59098091 A JP59098091 A JP 59098091A JP 9809184 A JP9809184 A JP 9809184A JP S60242671 A JPS60242671 A JP S60242671A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor
- base
- type
- doped
- base region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims abstract description 23
- 239000012535 impurity Substances 0.000 claims abstract description 15
- 229910001218 Gallium arsenide Inorganic materials 0.000 abstract description 14
- 230000003321 amplification Effects 0.000 abstract description 2
- 238000003199 nucleic acid amplification method Methods 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 1
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D10/00—Bipolar junction transistors [BJT]
- H10D10/80—Heterojunction BJTs
- H10D10/821—Vertical heterojunction BJTs
- H10D10/881—Resonant tunnelling transistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/81—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation
- H10D62/815—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW]
- H10D62/8161—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW] potential variation due to variations in composition or crystallinity, e.g. heterojunction superlattices
- H10D62/8162—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW] potential variation due to variations in composition or crystallinity, e.g. heterojunction superlattices having quantum effects only in the vertical direction, i.e. layered structures having quantum effects solely resulting from vertical potential variation
- H10D62/8164—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW] potential variation due to variations in composition or crystallinity, e.g. heterojunction superlattices having quantum effects only in the vertical direction, i.e. layered structures having quantum effects solely resulting from vertical potential variation comprising only semiconductor materials
Landscapes
- Bipolar Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59098091A JPS60242671A (ja) | 1984-05-16 | 1984-05-16 | ヘテロ接合バイポ−ラトランジスタ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59098091A JPS60242671A (ja) | 1984-05-16 | 1984-05-16 | ヘテロ接合バイポ−ラトランジスタ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60242671A true JPS60242671A (ja) | 1985-12-02 |
JPH0543178B2 JPH0543178B2 (enrdf_load_stackoverflow) | 1993-06-30 |
Family
ID=14210668
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59098091A Granted JPS60242671A (ja) | 1984-05-16 | 1984-05-16 | ヘテロ接合バイポ−ラトランジスタ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60242671A (enrdf_load_stackoverflow) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63260064A (ja) * | 1986-08-01 | 1988-10-27 | テキサス インスツルメンツ インコ−ポレイテツド | 3次元バイポ−ラウェ−ハ及び工程 |
US4797722A (en) * | 1986-05-23 | 1989-01-10 | U.S. Philips Corporation | Hot charge-carrier transistors |
US4929997A (en) * | 1986-12-22 | 1990-05-29 | Nec Corporation | Heterojunction bipolar transistor with ballistic operation |
US4979009A (en) * | 1987-06-08 | 1990-12-18 | Hitachi, Ltd. | Heterojunction bipolar transistor |
WO2004040652A1 (en) * | 2002-10-30 | 2004-05-13 | International Business Machines Corporation | Bipolar transistor having a base region with a constant bandgap layer and a graded bandgap layer |
WO2012102196A1 (ja) * | 2011-01-24 | 2012-08-02 | Nttエレクトロニクス株式会社 | 半導体装置 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58114455A (ja) * | 1981-12-28 | 1983-07-07 | Nec Corp | 半導体装置 |
-
1984
- 1984-05-16 JP JP59098091A patent/JPS60242671A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58114455A (ja) * | 1981-12-28 | 1983-07-07 | Nec Corp | 半導体装置 |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4797722A (en) * | 1986-05-23 | 1989-01-10 | U.S. Philips Corporation | Hot charge-carrier transistors |
JPS63260064A (ja) * | 1986-08-01 | 1988-10-27 | テキサス インスツルメンツ インコ−ポレイテツド | 3次元バイポ−ラウェ−ハ及び工程 |
US4929997A (en) * | 1986-12-22 | 1990-05-29 | Nec Corporation | Heterojunction bipolar transistor with ballistic operation |
US4979009A (en) * | 1987-06-08 | 1990-12-18 | Hitachi, Ltd. | Heterojunction bipolar transistor |
WO2004040652A1 (en) * | 2002-10-30 | 2004-05-13 | International Business Machines Corporation | Bipolar transistor having a base region with a constant bandgap layer and a graded bandgap layer |
US7170112B2 (en) | 2002-10-30 | 2007-01-30 | International Business Machines Corporation | Graded-base-bandgap bipolar transistor having a constant—bandgap in the base |
WO2012102196A1 (ja) * | 2011-01-24 | 2012-08-02 | Nttエレクトロニクス株式会社 | 半導体装置 |
JP2012156206A (ja) * | 2011-01-24 | 2012-08-16 | Ntt Electornics Corp | 半導体装置 |
CN103403848A (zh) * | 2011-01-24 | 2013-11-20 | Ntt电子股份有限公司 | 半导体器件 |
US8754445B2 (en) | 2011-01-24 | 2014-06-17 | Ntt Electronics Corporation | Semiconductor device |
CN103403848B (zh) * | 2011-01-24 | 2016-02-24 | Ntt电子股份有限公司 | 半导体器件 |
Also Published As
Publication number | Publication date |
---|---|
JPH0543178B2 (enrdf_load_stackoverflow) | 1993-06-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |