JPS6024050A - 薄膜素子の製造方法 - Google Patents

薄膜素子の製造方法

Info

Publication number
JPS6024050A
JPS6024050A JP13161583A JP13161583A JPS6024050A JP S6024050 A JPS6024050 A JP S6024050A JP 13161583 A JP13161583 A JP 13161583A JP 13161583 A JP13161583 A JP 13161583A JP S6024050 A JPS6024050 A JP S6024050A
Authority
JP
Japan
Prior art keywords
film
thin film
side wall
aperture
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13161583A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0454981B2 (https=
Inventor
Nobuo Toyokura
豊蔵　信夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13161583A priority Critical patent/JPS6024050A/ja
Publication of JPS6024050A publication Critical patent/JPS6024050A/ja
Publication of JPH0454981B2 publication Critical patent/JPH0454981B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Integrated Circuits (AREA)
JP13161583A 1983-07-19 1983-07-19 薄膜素子の製造方法 Granted JPS6024050A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13161583A JPS6024050A (ja) 1983-07-19 1983-07-19 薄膜素子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13161583A JPS6024050A (ja) 1983-07-19 1983-07-19 薄膜素子の製造方法

Publications (2)

Publication Number Publication Date
JPS6024050A true JPS6024050A (ja) 1985-02-06
JPH0454981B2 JPH0454981B2 (https=) 1992-09-01

Family

ID=15062201

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13161583A Granted JPS6024050A (ja) 1983-07-19 1983-07-19 薄膜素子の製造方法

Country Status (1)

Country Link
JP (1) JPS6024050A (https=)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6146051A (ja) * 1984-08-10 1986-03-06 Sony Corp 配線方法
JPS6362355A (ja) * 1986-09-03 1988-03-18 Nec Corp 半導体装置及びその製造方法
US5387311A (en) * 1993-02-16 1995-02-07 Vlsi Technology, Inc. Method for manufacturing anti-fuse structures
JP2005268749A (ja) * 2004-02-19 2005-09-29 Ricoh Co Ltd 半導体装置
JP2011009775A (ja) * 2004-02-19 2011-01-13 Ricoh Co Ltd 半導体装置の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5582458A (en) * 1978-12-18 1980-06-21 Toshiba Corp Preparation of semiconductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5582458A (en) * 1978-12-18 1980-06-21 Toshiba Corp Preparation of semiconductor device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6146051A (ja) * 1984-08-10 1986-03-06 Sony Corp 配線方法
JPS6362355A (ja) * 1986-09-03 1988-03-18 Nec Corp 半導体装置及びその製造方法
US5387311A (en) * 1993-02-16 1995-02-07 Vlsi Technology, Inc. Method for manufacturing anti-fuse structures
JP2005268749A (ja) * 2004-02-19 2005-09-29 Ricoh Co Ltd 半導体装置
JP2011009775A (ja) * 2004-02-19 2011-01-13 Ricoh Co Ltd 半導体装置の製造方法
US7999352B2 (en) 2004-02-19 2011-08-16 Ricoh Company, Ltd. Semiconductor device

Also Published As

Publication number Publication date
JPH0454981B2 (https=) 1992-09-01

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