JPS60217628A - パタ−ン形成方法 - Google Patents

パタ−ン形成方法

Info

Publication number
JPS60217628A
JPS60217628A JP59073452A JP7345284A JPS60217628A JP S60217628 A JPS60217628 A JP S60217628A JP 59073452 A JP59073452 A JP 59073452A JP 7345284 A JP7345284 A JP 7345284A JP S60217628 A JPS60217628 A JP S60217628A
Authority
JP
Japan
Prior art keywords
resist
exposed
pattern
pmma
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59073452A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0236049B2 (enExample
Inventor
Yoshihiro Todokoro
義博 戸所
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp, Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electronics Corp
Priority to JP59073452A priority Critical patent/JPS60217628A/ja
Publication of JPS60217628A publication Critical patent/JPS60217628A/ja
Publication of JPH0236049B2 publication Critical patent/JPH0236049B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59073452A 1984-04-12 1984-04-12 パタ−ン形成方法 Granted JPS60217628A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59073452A JPS60217628A (ja) 1984-04-12 1984-04-12 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59073452A JPS60217628A (ja) 1984-04-12 1984-04-12 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS60217628A true JPS60217628A (ja) 1985-10-31
JPH0236049B2 JPH0236049B2 (enExample) 1990-08-15

Family

ID=13518635

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59073452A Granted JPS60217628A (ja) 1984-04-12 1984-04-12 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS60217628A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09232498A (ja) * 1996-02-23 1997-09-05 Nec Corp 半導体装置

Also Published As

Publication number Publication date
JPH0236049B2 (enExample) 1990-08-15

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