JPS6224941B2 - - Google Patents

Info

Publication number
JPS6224941B2
JPS6224941B2 JP56198114A JP19811481A JPS6224941B2 JP S6224941 B2 JPS6224941 B2 JP S6224941B2 JP 56198114 A JP56198114 A JP 56198114A JP 19811481 A JP19811481 A JP 19811481A JP S6224941 B2 JPS6224941 B2 JP S6224941B2
Authority
JP
Japan
Prior art keywords
film
exposure
photoresist film
opening pattern
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56198114A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5898924A (ja
Inventor
Norio Nakamoto
Kimie Masaki
Akyo Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP56198114A priority Critical patent/JPS5898924A/ja
Publication of JPS5898924A publication Critical patent/JPS5898924A/ja
Publication of JPS6224941B2 publication Critical patent/JPS6224941B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP56198114A 1981-12-08 1981-12-08 微細パタ−ン形成方法 Granted JPS5898924A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56198114A JPS5898924A (ja) 1981-12-08 1981-12-08 微細パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56198114A JPS5898924A (ja) 1981-12-08 1981-12-08 微細パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS5898924A JPS5898924A (ja) 1983-06-13
JPS6224941B2 true JPS6224941B2 (enExample) 1987-05-30

Family

ID=16385697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56198114A Granted JPS5898924A (ja) 1981-12-08 1981-12-08 微細パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS5898924A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01105536A (ja) * 1987-10-19 1989-04-24 Sanyo Electric Co Ltd フォトレジストパターン形成方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5228267A (en) * 1975-08-28 1977-03-03 Nippon Telegr & Teleph Corp <Ntt> Minute processing
JPS5633827A (en) * 1979-08-29 1981-04-04 Seiko Epson Corp Photo etching method including surface treatment of substrate

Also Published As

Publication number Publication date
JPS5898924A (ja) 1983-06-13

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