JPS5898924A - 微細パタ−ン形成方法 - Google Patents

微細パタ−ン形成方法

Info

Publication number
JPS5898924A
JPS5898924A JP56198114A JP19811481A JPS5898924A JP S5898924 A JPS5898924 A JP S5898924A JP 56198114 A JP56198114 A JP 56198114A JP 19811481 A JP19811481 A JP 19811481A JP S5898924 A JPS5898924 A JP S5898924A
Authority
JP
Japan
Prior art keywords
photoresist
film
exposure
resist
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56198114A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6224941B2 (enExample
Inventor
Norio Nakamoto
中本　則雄
Kimie Masaki
正木　君江
Akiyo Hayashi
林　明代
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp, Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electronics Corp
Priority to JP56198114A priority Critical patent/JPS5898924A/ja
Publication of JPS5898924A publication Critical patent/JPS5898924A/ja
Publication of JPS6224941B2 publication Critical patent/JPS6224941B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP56198114A 1981-12-08 1981-12-08 微細パタ−ン形成方法 Granted JPS5898924A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56198114A JPS5898924A (ja) 1981-12-08 1981-12-08 微細パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56198114A JPS5898924A (ja) 1981-12-08 1981-12-08 微細パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS5898924A true JPS5898924A (ja) 1983-06-13
JPS6224941B2 JPS6224941B2 (enExample) 1987-05-30

Family

ID=16385697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56198114A Granted JPS5898924A (ja) 1981-12-08 1981-12-08 微細パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS5898924A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01105536A (ja) * 1987-10-19 1989-04-24 Sanyo Electric Co Ltd フォトレジストパターン形成方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5228267A (en) * 1975-08-28 1977-03-03 Nippon Telegr & Teleph Corp <Ntt> Minute processing
JPS5633827A (en) * 1979-08-29 1981-04-04 Seiko Epson Corp Photo etching method including surface treatment of substrate

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5228267A (en) * 1975-08-28 1977-03-03 Nippon Telegr & Teleph Corp <Ntt> Minute processing
JPS5633827A (en) * 1979-08-29 1981-04-04 Seiko Epson Corp Photo etching method including surface treatment of substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01105536A (ja) * 1987-10-19 1989-04-24 Sanyo Electric Co Ltd フォトレジストパターン形成方法

Also Published As

Publication number Publication date
JPS6224941B2 (enExample) 1987-05-30

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