JPS60211067A - 薄膜形成装置 - Google Patents

薄膜形成装置

Info

Publication number
JPS60211067A
JPS60211067A JP6944484A JP6944484A JPS60211067A JP S60211067 A JPS60211067 A JP S60211067A JP 6944484 A JP6944484 A JP 6944484A JP 6944484 A JP6944484 A JP 6944484A JP S60211067 A JPS60211067 A JP S60211067A
Authority
JP
Japan
Prior art keywords
crucible
vapor
base plate
metal
film forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6944484A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0225424B2 (enrdf_load_stackoverflow
Inventor
Tateo Motoyoshi
本吉　健郎
Masahiro Hanai
正博 花井
Teruo Ina
伊奈　照夫
Kenichiro Yamanishi
山西　健一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP6944484A priority Critical patent/JPS60211067A/ja
Publication of JPS60211067A publication Critical patent/JPS60211067A/ja
Publication of JPH0225424B2 publication Critical patent/JPH0225424B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP6944484A 1984-04-06 1984-04-06 薄膜形成装置 Granted JPS60211067A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6944484A JPS60211067A (ja) 1984-04-06 1984-04-06 薄膜形成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6944484A JPS60211067A (ja) 1984-04-06 1984-04-06 薄膜形成装置

Publications (2)

Publication Number Publication Date
JPS60211067A true JPS60211067A (ja) 1985-10-23
JPH0225424B2 JPH0225424B2 (enrdf_load_stackoverflow) 1990-06-04

Family

ID=13402812

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6944484A Granted JPS60211067A (ja) 1984-04-06 1984-04-06 薄膜形成装置

Country Status (1)

Country Link
JP (1) JPS60211067A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01152265A (ja) * 1987-12-10 1989-06-14 Hitachi Ltd 高指向性蒸着装置
US4962727A (en) * 1988-09-12 1990-10-16 Mitsubishi Denki Kabushiki Kaisha Thin film-forming apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01152265A (ja) * 1987-12-10 1989-06-14 Hitachi Ltd 高指向性蒸着装置
US4962727A (en) * 1988-09-12 1990-10-16 Mitsubishi Denki Kabushiki Kaisha Thin film-forming apparatus

Also Published As

Publication number Publication date
JPH0225424B2 (enrdf_load_stackoverflow) 1990-06-04

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