JPH0225424B2 - - Google Patents

Info

Publication number
JPH0225424B2
JPH0225424B2 JP6944484A JP6944484A JPH0225424B2 JP H0225424 B2 JPH0225424 B2 JP H0225424B2 JP 6944484 A JP6944484 A JP 6944484A JP 6944484 A JP6944484 A JP 6944484A JP H0225424 B2 JPH0225424 B2 JP H0225424B2
Authority
JP
Japan
Prior art keywords
crucible
insulating material
heat insulating
thin film
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6944484A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60211067A (ja
Inventor
Tateo Motoyoshi
Masahiro Hanai
Teruo Ina
Kenichiro Yamanishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP6944484A priority Critical patent/JPS60211067A/ja
Publication of JPS60211067A publication Critical patent/JPS60211067A/ja
Publication of JPH0225424B2 publication Critical patent/JPH0225424B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP6944484A 1984-04-06 1984-04-06 薄膜形成装置 Granted JPS60211067A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6944484A JPS60211067A (ja) 1984-04-06 1984-04-06 薄膜形成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6944484A JPS60211067A (ja) 1984-04-06 1984-04-06 薄膜形成装置

Publications (2)

Publication Number Publication Date
JPS60211067A JPS60211067A (ja) 1985-10-23
JPH0225424B2 true JPH0225424B2 (enrdf_load_stackoverflow) 1990-06-04

Family

ID=13402812

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6944484A Granted JPS60211067A (ja) 1984-04-06 1984-04-06 薄膜形成装置

Country Status (1)

Country Link
JP (1) JPS60211067A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0745711B2 (ja) * 1987-12-10 1995-05-17 株式会社日立製作所 高指向性蒸着装置
JP2701363B2 (ja) * 1988-09-12 1998-01-21 三菱電機株式会社 半導体装置の製造方法及びそれに使用する薄膜形成装置

Also Published As

Publication number Publication date
JPS60211067A (ja) 1985-10-23

Similar Documents

Publication Publication Date Title
KR100276779B1 (ko) 집적회로 제조시 재료를 증착시키는 개선된 방법
JPH07286270A (ja) 被覆装置
JP4570232B2 (ja) プラズマディスプレイ保護膜形成装置および保護膜形成方法
JPH0225424B2 (enrdf_load_stackoverflow)
JPH0598425A (ja) 薄膜形成装置
JPS60255971A (ja) 薄膜形成装置
DE1521175B2 (de) Vorrichtung zur verdampfung von werkstoffen im vakuum
JPS61272367A (ja) 薄膜形成装置
JPH04228562A (ja) 薄膜形成装置
JPS60183721A (ja) 薄膜蒸着装置
KR0144917B1 (ko) 하향분사가 가능한 소오스 구조를 이용한 이온빔 증착방법 및 그 장치
JPS61279668A (ja) 薄膜形成装置
DE2628765C3 (de) Vorrichtung zum Aufdampfen insbesondere sublimierbarer Stoffe im Vakuum mittels einer Elektronenstrahlquelle
JPH01119663A (ja) 薄膜形成装置
JPS60183719A (ja) 薄膜蒸着装置
JPH07252645A (ja) 薄膜形成装置
KR910007157B1 (ko) 박막형성장치
JPH0347571B2 (enrdf_load_stackoverflow)
JPS61272368A (ja) 薄膜形成装置
JPS60116771A (ja) クラスタイオンビ−ム蒸発源装置
JPH0342034Y2 (enrdf_load_stackoverflow)
JPS648267A (en) Thin film forming device
JPS60183720A (ja) 薄膜蒸着装置
KR920005620Y1 (ko) 박막 증착 장치용 마스크
JP4837818B2 (ja) 真空成膜装置