JPS6021051A - レンズ投影露光方法及び装置 - Google Patents

レンズ投影露光方法及び装置

Info

Publication number
JPS6021051A
JPS6021051A JP58128399A JP12839983A JPS6021051A JP S6021051 A JPS6021051 A JP S6021051A JP 58128399 A JP58128399 A JP 58128399A JP 12839983 A JP12839983 A JP 12839983A JP S6021051 A JPS6021051 A JP S6021051A
Authority
JP
Japan
Prior art keywords
original
exposed
pattern
lens
projection lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58128399A
Other languages
English (en)
Japanese (ja)
Other versions
JPH037138B2 (enrdf_load_stackoverflow
Inventor
Toshiyuki Horiuchi
敏行 堀内
Masanori Suzuki
雅則 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP58128399A priority Critical patent/JPS6021051A/ja
Publication of JPS6021051A publication Critical patent/JPS6021051A/ja
Publication of JPH037138B2 publication Critical patent/JPH037138B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58128399A 1983-07-14 1983-07-14 レンズ投影露光方法及び装置 Granted JPS6021051A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58128399A JPS6021051A (ja) 1983-07-14 1983-07-14 レンズ投影露光方法及び装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58128399A JPS6021051A (ja) 1983-07-14 1983-07-14 レンズ投影露光方法及び装置

Publications (2)

Publication Number Publication Date
JPS6021051A true JPS6021051A (ja) 1985-02-02
JPH037138B2 JPH037138B2 (enrdf_load_stackoverflow) 1991-01-31

Family

ID=14983834

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58128399A Granted JPS6021051A (ja) 1983-07-14 1983-07-14 レンズ投影露光方法及び装置

Country Status (1)

Country Link
JP (1) JPS6021051A (enrdf_load_stackoverflow)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62224026A (ja) * 1986-03-12 1987-10-02 ア−エスエム・リングラフイ−・ビ−・ヴエ− マスクと基板とを互に整列させるアラインメント方法および装置
JPS6313331A (ja) * 1986-07-04 1988-01-20 Hitachi Ltd 縮小投影露光装置
JPS6341021A (ja) * 1986-08-06 1988-02-22 Nec Corp 縮小投影露光装置
JPS6354721A (ja) * 1986-08-25 1988-03-09 Nikon Corp 投影露光装置
US4730927A (en) * 1985-04-09 1988-03-15 Nippon Kogaku K.K. Method and apparatus for measuring positions on the surface of a flat object
JPS6365442A (ja) * 1986-09-08 1988-03-24 Mitsubishi Electric Corp 縮小投影露光装置
JPS63164212A (ja) * 1986-12-26 1988-07-07 Hitachi Ltd 縮小投影露光装置
JPS6449227A (en) * 1987-08-19 1989-02-23 Hitachi Ltd Stepper
JPH0338820A (ja) * 1989-07-05 1991-02-19 Seiko Instr Inc 半導体装置の製造方法
JP2009117872A (ja) * 2004-05-14 2009-05-28 Asml Netherlands Bv アラインメントシステム及び方法及びそれにより製造したデバイス

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS516565A (enrdf_load_stackoverflow) * 1974-06-06 1976-01-20 Ibm
JPS5315078A (en) * 1976-07-23 1978-02-10 Siemens Ag Method of automatically adjusting layer material

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS516565A (enrdf_load_stackoverflow) * 1974-06-06 1976-01-20 Ibm
JPS5315078A (en) * 1976-07-23 1978-02-10 Siemens Ag Method of automatically adjusting layer material

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4730927A (en) * 1985-04-09 1988-03-15 Nippon Kogaku K.K. Method and apparatus for measuring positions on the surface of a flat object
JPS62224026A (ja) * 1986-03-12 1987-10-02 ア−エスエム・リングラフイ−・ビ−・ヴエ− マスクと基板とを互に整列させるアラインメント方法および装置
JPS6313331A (ja) * 1986-07-04 1988-01-20 Hitachi Ltd 縮小投影露光装置
JPS6341021A (ja) * 1986-08-06 1988-02-22 Nec Corp 縮小投影露光装置
JPS6354721A (ja) * 1986-08-25 1988-03-09 Nikon Corp 投影露光装置
JPS6365442A (ja) * 1986-09-08 1988-03-24 Mitsubishi Electric Corp 縮小投影露光装置
JPS63164212A (ja) * 1986-12-26 1988-07-07 Hitachi Ltd 縮小投影露光装置
JPS6449227A (en) * 1987-08-19 1989-02-23 Hitachi Ltd Stepper
JPH0338820A (ja) * 1989-07-05 1991-02-19 Seiko Instr Inc 半導体装置の製造方法
JP2009117872A (ja) * 2004-05-14 2009-05-28 Asml Netherlands Bv アラインメントシステム及び方法及びそれにより製造したデバイス

Also Published As

Publication number Publication date
JPH037138B2 (enrdf_load_stackoverflow) 1991-01-31

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