JPS60194537A - 整列装置 - Google Patents
整列装置Info
- Publication number
- JPS60194537A JPS60194537A JP60032947A JP3294785A JPS60194537A JP S60194537 A JPS60194537 A JP S60194537A JP 60032947 A JP60032947 A JP 60032947A JP 3294785 A JP3294785 A JP 3294785A JP S60194537 A JPS60194537 A JP S60194537A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- optical path
- optical
- stage
- focusing means
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims description 72
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
- 230000002093 peripheral effect Effects 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- 238000012937 correction Methods 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 description 79
- 238000000034 method Methods 0.000 description 10
- 238000007689 inspection Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 238000003909 pattern recognition Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 102100031584 Cell division cycle-associated 7-like protein Human genes 0.000 description 1
- 101000777638 Homo sapiens Cell division cycle-associated 7-like protein Proteins 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000013480 data collection Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Control Of Position Or Direction (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US58259084A | 1984-02-22 | 1984-02-22 | |
US582590 | 1984-02-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS60194537A true JPS60194537A (ja) | 1985-10-03 |
Family
ID=24329741
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60032947A Pending JPS60194537A (ja) | 1984-02-22 | 1985-02-22 | 整列装置 |
JP1990124134U Expired - Lifetime JPH0537476Y2 (enrdf_load_stackoverflow) | 1984-02-22 | 1990-11-26 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1990124134U Expired - Lifetime JPH0537476Y2 (enrdf_load_stackoverflow) | 1984-02-22 | 1990-11-26 |
Country Status (1)
Country | Link |
---|---|
JP (2) | JPS60194537A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6262538A (ja) * | 1985-09-13 | 1987-03-19 | Toshiba Corp | 位置決め装置 |
JPH01123346U (enrdf_load_stackoverflow) * | 1988-02-15 | 1989-08-22 | ||
JP2015226043A (ja) * | 2014-05-30 | 2015-12-14 | 株式会社ディスコ | ウェーハid読み取り装置 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5560148B2 (ja) * | 2010-09-14 | 2014-07-23 | 株式会社日立ハイテクノロジーズ | 検査装置、及び位置決め装置 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57133428A (en) * | 1981-02-12 | 1982-08-18 | Nippon Kogaku Kk <Nikon> | Alignment optical system capable of variable magnification |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54159876A (en) * | 1978-06-07 | 1979-12-18 | Nec Corp | Wafer position detection method and its unit |
JPS56134741A (en) * | 1980-03-25 | 1981-10-21 | Toshiba Corp | Position detecting device |
JPS574134A (en) * | 1980-06-10 | 1982-01-09 | Fujitsu Ltd | Recognizing device |
JPS57167651A (en) * | 1981-04-07 | 1982-10-15 | Mitsubishi Electric Corp | Inspecting device for surface of semiconductor wafer |
JPS57169251A (en) * | 1981-04-09 | 1982-10-18 | Toshiba Corp | Recognizing device for position |
JPS57198641A (en) * | 1981-05-30 | 1982-12-06 | Toshiba Corp | Pattern detection |
JPS5919344A (ja) * | 1982-07-23 | 1984-01-31 | Hitachi Ltd | 2視野光学装置 |
-
1985
- 1985-02-22 JP JP60032947A patent/JPS60194537A/ja active Pending
-
1990
- 1990-11-26 JP JP1990124134U patent/JPH0537476Y2/ja not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57133428A (en) * | 1981-02-12 | 1982-08-18 | Nippon Kogaku Kk <Nikon> | Alignment optical system capable of variable magnification |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6262538A (ja) * | 1985-09-13 | 1987-03-19 | Toshiba Corp | 位置決め装置 |
JPH01123346U (enrdf_load_stackoverflow) * | 1988-02-15 | 1989-08-22 | ||
JP2015226043A (ja) * | 2014-05-30 | 2015-12-14 | 株式会社ディスコ | ウェーハid読み取り装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH0373451U (enrdf_load_stackoverflow) | 1991-07-24 |
JPH0537476Y2 (enrdf_load_stackoverflow) | 1993-09-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4845373A (en) | Automatic alignment apparatus having low and high resolution optics for coarse and fine adjusting | |
KR100291607B1 (ko) | 편평한인장형섀도우마스크칼라음극선관구성에사용하기위한광학검색시스템 | |
US6175646B1 (en) | Apparatus for detecting defective integrated circuit dies in wafer form | |
US6504948B1 (en) | Apparatus and method for automatically detecting defects on silicon dies on silicon wafers | |
JP4236044B2 (ja) | 露光装置内でウエハを位置決めする装置および方法 | |
US6865288B1 (en) | Pattern inspection method and apparatus | |
US6487307B1 (en) | System and method of optically inspecting structures on an object | |
US6774991B1 (en) | Method and apparatus for inspecting a patterned semiconductor wafer | |
KR960013357B1 (ko) | 화상데이타 검사방법 및 장치 | |
JP2004212221A (ja) | パターン検査方法及びパターン検査装置 | |
US20040022429A1 (en) | Scanning microscope and inspection method employing the scanning microscope | |
JP4207302B2 (ja) | バンプ検査方法およびその検査装置 | |
JPH11160247A (ja) | 外観検査方法およびその装置 | |
JPS60194537A (ja) | 整列装置 | |
WO2002012870A2 (en) | System and method for inspecting bumped wafers | |
JP2000131037A (ja) | 物体形状検査装置 | |
JPH07297241A (ja) | プローブ方法 | |
JP2010141189A (ja) | 半導体ウェハ検査装置 | |
EP0466562B1 (en) | Method and apparatus for measuring three-dimensional configuration of wire-shaped object in a short time | |
US7684610B2 (en) | Rotating prism component inspection system | |
JPH11307567A (ja) | バンプ検査工程を有する半導体装置の製造方法 | |
JPH1063846A (ja) | 外観検査装置 | |
JPH1137723A (ja) | 高さ検査装置 | |
JPS58151544A (ja) | 暗視野像による欠陥検査装置 | |
JP3816627B2 (ja) | パターン検査装置 |