JPS60187671A - 反応スパツタリング法による積層被膜の形成方法 - Google Patents

反応スパツタリング法による積層被膜の形成方法

Info

Publication number
JPS60187671A
JPS60187671A JP4135084A JP4135084A JPS60187671A JP S60187671 A JPS60187671 A JP S60187671A JP 4135084 A JP4135084 A JP 4135084A JP 4135084 A JP4135084 A JP 4135084A JP S60187671 A JPS60187671 A JP S60187671A
Authority
JP
Japan
Prior art keywords
titanium
layer
target
reactive sputtering
titanium oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4135084A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0325506B2 (enrdf_load_stackoverflow
Inventor
Masashi Tada
昌史 多田
Mamoru Mizuhashi
衛 水橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP4135084A priority Critical patent/JPS60187671A/ja
Publication of JPS60187671A publication Critical patent/JPS60187671A/ja
Publication of JPH0325506B2 publication Critical patent/JPH0325506B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP4135084A 1984-03-06 1984-03-06 反応スパツタリング法による積層被膜の形成方法 Granted JPS60187671A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4135084A JPS60187671A (ja) 1984-03-06 1984-03-06 反応スパツタリング法による積層被膜の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4135084A JPS60187671A (ja) 1984-03-06 1984-03-06 反応スパツタリング法による積層被膜の形成方法

Publications (2)

Publication Number Publication Date
JPS60187671A true JPS60187671A (ja) 1985-09-25
JPH0325506B2 JPH0325506B2 (enrdf_load_stackoverflow) 1991-04-08

Family

ID=12606059

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4135084A Granted JPS60187671A (ja) 1984-03-06 1984-03-06 反応スパツタリング法による積層被膜の形成方法

Country Status (1)

Country Link
JP (1) JPS60187671A (enrdf_load_stackoverflow)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63190742A (ja) * 1987-01-30 1988-08-08 Asahi Glass Co Ltd 熱線反射ガラスの製法
JPS63206333A (ja) * 1987-02-24 1988-08-25 Asahi Glass Co Ltd 単板熱線反射ガラス
JPS63252944A (ja) * 1987-04-10 1988-10-20 Nippon Sheet Glass Co Ltd 透明熱線反射板
JPH0244046A (ja) * 1988-08-03 1990-02-14 Nippon Sheet Glass Co Ltd 青色乃至緑色の反射色を呈する透明板およびその製造方法
JPH02244622A (ja) * 1989-03-16 1990-09-28 Fujitsu Ltd 半導体装置の製造方法
JPH03126861A (ja) * 1989-09-11 1991-05-30 Union Carbide Coatings Services Technol Corp ニトリド含有化合物の多層被覆及びその形成法
WO2014185026A1 (ja) * 2013-05-15 2014-11-20 株式会社ニコン 化合物膜の製造方法

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63190742A (ja) * 1987-01-30 1988-08-08 Asahi Glass Co Ltd 熱線反射ガラスの製法
JPS63206333A (ja) * 1987-02-24 1988-08-25 Asahi Glass Co Ltd 単板熱線反射ガラス
JPS63252944A (ja) * 1987-04-10 1988-10-20 Nippon Sheet Glass Co Ltd 透明熱線反射板
JPH0244046A (ja) * 1988-08-03 1990-02-14 Nippon Sheet Glass Co Ltd 青色乃至緑色の反射色を呈する透明板およびその製造方法
JPH02244622A (ja) * 1989-03-16 1990-09-28 Fujitsu Ltd 半導体装置の製造方法
JPH03126861A (ja) * 1989-09-11 1991-05-30 Union Carbide Coatings Services Technol Corp ニトリド含有化合物の多層被覆及びその形成法
WO2014185026A1 (ja) * 2013-05-15 2014-11-20 株式会社ニコン 化合物膜の製造方法
JPWO2014185026A1 (ja) * 2013-05-15 2017-02-23 株式会社ニコン 化合物膜の製造方法
US9719164B2 (en) 2013-05-15 2017-08-01 Nikon Corporation Method of manufacturing compound film

Also Published As

Publication number Publication date
JPH0325506B2 (enrdf_load_stackoverflow) 1991-04-08

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