JPH0325506B2 - - Google Patents

Info

Publication number
JPH0325506B2
JPH0325506B2 JP4135084A JP4135084A JPH0325506B2 JP H0325506 B2 JPH0325506 B2 JP H0325506B2 JP 4135084 A JP4135084 A JP 4135084A JP 4135084 A JP4135084 A JP 4135084A JP H0325506 B2 JPH0325506 B2 JP H0325506B2
Authority
JP
Japan
Prior art keywords
titanium
titanium oxide
layer
oxide layer
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP4135084A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60187671A (ja
Inventor
Masashi Tada
Mamoru Mizuhashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP4135084A priority Critical patent/JPS60187671A/ja
Publication of JPS60187671A publication Critical patent/JPS60187671A/ja
Publication of JPH0325506B2 publication Critical patent/JPH0325506B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP4135084A 1984-03-06 1984-03-06 反応スパツタリング法による積層被膜の形成方法 Granted JPS60187671A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4135084A JPS60187671A (ja) 1984-03-06 1984-03-06 反応スパツタリング法による積層被膜の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4135084A JPS60187671A (ja) 1984-03-06 1984-03-06 反応スパツタリング法による積層被膜の形成方法

Publications (2)

Publication Number Publication Date
JPS60187671A JPS60187671A (ja) 1985-09-25
JPH0325506B2 true JPH0325506B2 (enrdf_load_stackoverflow) 1991-04-08

Family

ID=12606059

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4135084A Granted JPS60187671A (ja) 1984-03-06 1984-03-06 反応スパツタリング法による積層被膜の形成方法

Country Status (1)

Country Link
JP (1) JPS60187671A (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63190742A (ja) * 1987-01-30 1988-08-08 Asahi Glass Co Ltd 熱線反射ガラスの製法
JPH0684256B2 (ja) * 1987-02-24 1994-10-26 旭硝子株式会社 単板熱線反射ガラス
JPS63252944A (ja) * 1987-04-10 1988-10-20 Nippon Sheet Glass Co Ltd 透明熱線反射板
JP2722509B2 (ja) * 1988-08-03 1998-03-04 日本板硝子株式会社 青色乃至緑色の反射色を呈する透明板およびその製造方法
JP2768364B2 (ja) * 1989-03-16 1998-06-25 富士通株式会社 半導体装置の製造方法
AU629145B2 (en) * 1989-09-11 1992-09-24 Union Carbide Coatings Service Technology Corp. Multilayer coating of a nitride-containing compound and method for producing it
CN105026606B (zh) 2013-05-15 2018-03-27 株式会社尼康 化合物膜的制造方法

Also Published As

Publication number Publication date
JPS60187671A (ja) 1985-09-25

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