JPS60178641A - 半導体装置 - Google Patents
半導体装置Info
- Publication number
- JPS60178641A JPS60178641A JP3345884A JP3345884A JPS60178641A JP S60178641 A JPS60178641 A JP S60178641A JP 3345884 A JP3345884 A JP 3345884A JP 3345884 A JP3345884 A JP 3345884A JP S60178641 A JPS60178641 A JP S60178641A
- Authority
- JP
- Japan
- Prior art keywords
- wiring
- layer
- wirings
- sections
- layer wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims description 10
- 239000012212 insulator Substances 0.000 claims abstract description 12
- 210000004709 eyebrow Anatomy 0.000 claims description 2
- 239000010410 layer Substances 0.000 abstract description 55
- 239000011229 interlayer Substances 0.000 abstract description 9
- 230000000694 effects Effects 0.000 abstract description 3
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 239000002184 metal Substances 0.000 abstract description 2
- 239000011248 coating agent Substances 0.000 abstract 3
- 238000000576 coating method Methods 0.000 abstract 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000002950 deficient Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3345884A JPS60178641A (ja) | 1984-02-24 | 1984-02-24 | 半導体装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3345884A JPS60178641A (ja) | 1984-02-24 | 1984-02-24 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60178641A true JPS60178641A (ja) | 1985-09-12 |
JPH0519303B2 JPH0519303B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-03-16 |
Family
ID=12387094
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3345884A Granted JPS60178641A (ja) | 1984-02-24 | 1984-02-24 | 半導体装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60178641A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5357138A (en) * | 1991-02-22 | 1994-10-18 | Nec Corporation | Coaxial wiring pattern structure in a multilayered wiring board |
US5523625A (en) * | 1993-10-22 | 1996-06-04 | Nec Corporation | Semiconductor integrated circuit device having partially constricted lower wiring for preventing upper wirings from short-circuit |
US5910684A (en) * | 1995-11-03 | 1999-06-08 | Micron Technology, Inc. | Integrated circuitry |
US6091150A (en) * | 1996-09-03 | 2000-07-18 | Micron Technology, Inc. | Integrated circuitry comprising electrically insulative material over interconnect line tops, sidewalls and bottoms |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5138987A (ja) * | 1974-09-30 | 1976-03-31 | Hitachi Ltd | Haisensonokeiseihoho |
-
1984
- 1984-02-24 JP JP3345884A patent/JPS60178641A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5138987A (ja) * | 1974-09-30 | 1976-03-31 | Hitachi Ltd | Haisensonokeiseihoho |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5357138A (en) * | 1991-02-22 | 1994-10-18 | Nec Corporation | Coaxial wiring pattern structure in a multilayered wiring board |
US5523625A (en) * | 1993-10-22 | 1996-06-04 | Nec Corporation | Semiconductor integrated circuit device having partially constricted lower wiring for preventing upper wirings from short-circuit |
US5910684A (en) * | 1995-11-03 | 1999-06-08 | Micron Technology, Inc. | Integrated circuitry |
US6066553A (en) * | 1995-11-03 | 2000-05-23 | Micron Technology, Inc. | Semiconductor processing method of forming electrically conductive interconnect lines and integrated circuitry |
US6432813B1 (en) | 1995-11-03 | 2002-08-13 | Micron Technology, Inc. | Semiconductor processing method of forming insulative material over conductive lines |
US6091150A (en) * | 1996-09-03 | 2000-07-18 | Micron Technology, Inc. | Integrated circuitry comprising electrically insulative material over interconnect line tops, sidewalls and bottoms |
Also Published As
Publication number | Publication date |
---|---|
JPH0519303B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-03-16 |
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