JPS60166946A - 感光性樹脂組成物およびそれを用いる屈折率差を有するパタ−ンの作成方法 - Google Patents

感光性樹脂組成物およびそれを用いる屈折率差を有するパタ−ンの作成方法

Info

Publication number
JPS60166946A
JPS60166946A JP19206283A JP19206283A JPS60166946A JP S60166946 A JPS60166946 A JP S60166946A JP 19206283 A JP19206283 A JP 19206283A JP 19206283 A JP19206283 A JP 19206283A JP S60166946 A JPS60166946 A JP S60166946A
Authority
JP
Japan
Prior art keywords
photosensitive resin
group
polymer
resin composition
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19206283A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0371705B2 (enrdf_load_stackoverflow
Inventor
Isamu Kato
勇 加藤
Kozo Nakao
中尾　公三
Kiyoshi Takahashi
清 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyowa Gas Chemical Industry Co Ltd
Original Assignee
Kyowa Gas Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyowa Gas Chemical Industry Co Ltd filed Critical Kyowa Gas Chemical Industry Co Ltd
Priority to JP19206283A priority Critical patent/JPS60166946A/ja
Publication of JPS60166946A publication Critical patent/JPS60166946A/ja
Publication of JPH0371705B2 publication Critical patent/JPH0371705B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Integrated Circuits (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP19206283A 1983-10-14 1983-10-14 感光性樹脂組成物およびそれを用いる屈折率差を有するパタ−ンの作成方法 Granted JPS60166946A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19206283A JPS60166946A (ja) 1983-10-14 1983-10-14 感光性樹脂組成物およびそれを用いる屈折率差を有するパタ−ンの作成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19206283A JPS60166946A (ja) 1983-10-14 1983-10-14 感光性樹脂組成物およびそれを用いる屈折率差を有するパタ−ンの作成方法

Publications (2)

Publication Number Publication Date
JPS60166946A true JPS60166946A (ja) 1985-08-30
JPH0371705B2 JPH0371705B2 (enrdf_load_stackoverflow) 1991-11-14

Family

ID=16284984

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19206283A Granted JPS60166946A (ja) 1983-10-14 1983-10-14 感光性樹脂組成物およびそれを用いる屈折率差を有するパタ−ンの作成方法

Country Status (1)

Country Link
JP (1) JPS60166946A (enrdf_load_stackoverflow)

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6295526A (ja) * 1985-10-22 1987-05-02 Kuraray Co Ltd 感光性樹脂組成物およびそれを用いたパタ−ンの作製法
JPS62174703A (ja) * 1985-10-22 1987-07-31 Kuraray Co Ltd 形態屈折率双変調型位相格子の作製方法
JPS63218906A (ja) * 1987-03-07 1988-09-12 Kuraray Co Ltd 形態屈折率双変調型導波路レンズ
JPS649447A (en) * 1987-06-30 1989-01-12 Kuraray Co Pattern forming process
JPS649448A (en) * 1987-06-30 1989-01-12 Kuraray Co Pattern forming process
JPH01302307A (ja) * 1988-05-31 1989-12-06 Matsushita Electric Ind Co Ltd 屈折率差のあるパターン作成方法及びそれに供するパターン転写体と像形成体
JPH031145A (ja) * 1989-05-29 1991-01-07 Kuraray Co Ltd 感光性樹脂組成物、それを用いたパターンおよびパターン作製法
JPH0315070A (ja) * 1989-03-08 1991-01-23 Kuraray Co Ltd 感光性樹脂組成物、それを用いたパターンおよびパターン作製法
US5161042A (en) * 1990-06-28 1992-11-03 Sharp Kabushiki Kaisha Color liquid crystal display device using dichroic mirrors for focusing different colors in different directions
WO2008138732A1 (en) 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
EP2402315A1 (en) 2007-05-11 2012-01-04 Basf Se Oxime ester photoinitiators
WO2012045736A1 (en) 2010-10-05 2012-04-12 Basf Se Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions
WO2013083505A1 (en) 2011-12-07 2013-06-13 Basf Se Oxime ester photoinitiators
WO2013167515A1 (en) 2012-05-09 2013-11-14 Basf Se Oxime ester photoinitiators
WO2015004565A1 (en) 2013-07-08 2015-01-15 Basf Se Oxime ester photoinitiators
WO2015036910A1 (en) 2013-09-10 2015-03-19 Basf Se Oxime ester photoinitiators
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
WO2020152120A1 (en) 2019-01-23 2020-07-30 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
WO2021175855A1 (en) 2020-03-04 2021-09-10 Basf Se Oxime ester photoinitiators

Cited By (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62174703A (ja) * 1985-10-22 1987-07-31 Kuraray Co Ltd 形態屈折率双変調型位相格子の作製方法
JPS6295526A (ja) * 1985-10-22 1987-05-02 Kuraray Co Ltd 感光性樹脂組成物およびそれを用いたパタ−ンの作製法
JPS63218906A (ja) * 1987-03-07 1988-09-12 Kuraray Co Ltd 形態屈折率双変調型導波路レンズ
JPS649447A (en) * 1987-06-30 1989-01-12 Kuraray Co Pattern forming process
JPS649448A (en) * 1987-06-30 1989-01-12 Kuraray Co Pattern forming process
JPH01302307A (ja) * 1988-05-31 1989-12-06 Matsushita Electric Ind Co Ltd 屈折率差のあるパターン作成方法及びそれに供するパターン転写体と像形成体
JPH0315070A (ja) * 1989-03-08 1991-01-23 Kuraray Co Ltd 感光性樹脂組成物、それを用いたパターンおよびパターン作製法
JPH031145A (ja) * 1989-05-29 1991-01-07 Kuraray Co Ltd 感光性樹脂組成物、それを用いたパターンおよびパターン作製法
US5161042A (en) * 1990-06-28 1992-11-03 Sharp Kabushiki Kaisha Color liquid crystal display device using dichroic mirrors for focusing different colors in different directions
WO2008138732A1 (en) 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
EP2402315A1 (en) 2007-05-11 2012-01-04 Basf Se Oxime ester photoinitiators
WO2012045736A1 (en) 2010-10-05 2012-04-12 Basf Se Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
WO2013083505A1 (en) 2011-12-07 2013-06-13 Basf Se Oxime ester photoinitiators
US9365515B2 (en) 2011-12-07 2016-06-14 Basf Se Oxime ester photoinitiators
US9864273B2 (en) 2012-05-09 2018-01-09 Basf Se Oxime ester photoinitiators
US11204554B2 (en) 2012-05-09 2021-12-21 Basf Se Oxime ester photoinitiators
EP2963016A1 (en) 2012-05-09 2016-01-06 Basf Se Oxime ester photoinitiators
EP2963015A1 (en) 2012-05-09 2016-01-06 Basf Se Oxime ester photoinitiators
EP2963014A1 (en) 2012-05-09 2016-01-06 Basf Se Oxime ester photoinitiators
WO2013167515A1 (en) 2012-05-09 2013-11-14 Basf Se Oxime ester photoinitiators
US11209734B2 (en) 2012-05-09 2021-12-28 Basf Se Oxime ester photoinitiators
EP3354641A1 (en) 2012-05-09 2018-08-01 Basf Se Oxime ester photoinitiators
US10488756B2 (en) 2012-05-09 2019-11-26 Basf Se Oxime ester photoinitiators
US11209733B2 (en) 2012-05-09 2021-12-28 Basf Se Oxime ester photoinitiators
WO2015004565A1 (en) 2013-07-08 2015-01-15 Basf Se Oxime ester photoinitiators
US9957258B2 (en) 2013-09-10 2018-05-01 Basf Se Oxime ester photoinitiators
US10793555B2 (en) 2013-09-10 2020-10-06 Basf Se Oxime ester photoinitiators
WO2015036910A1 (en) 2013-09-10 2015-03-19 Basf Se Oxime ester photoinitiators
WO2020152120A1 (en) 2019-01-23 2020-07-30 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
WO2021175855A1 (en) 2020-03-04 2021-09-10 Basf Se Oxime ester photoinitiators

Also Published As

Publication number Publication date
JPH0371705B2 (enrdf_load_stackoverflow) 1991-11-14

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