JPS649447A - Pattern forming process - Google Patents

Pattern forming process

Info

Publication number
JPS649447A
JPS649447A JP16500487A JP16500487A JPS649447A JP S649447 A JPS649447 A JP S649447A JP 16500487 A JP16500487 A JP 16500487A JP 16500487 A JP16500487 A JP 16500487A JP S649447 A JPS649447 A JP S649447A
Authority
JP
Japan
Prior art keywords
film
cause
photoreactive
pattern
functional groups
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16500487A
Other languages
Japanese (ja)
Other versions
JP2571788B2 (en
Inventor
Yoshihiro Kawatsuki
Masao Uetsuki
Tsutomu Iguchi
Akiji Takahashi
Toshiaki Tokuhara
Kazuo Baba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kuraray Co Ltd
Original Assignee
Kuraray Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kuraray Co Ltd filed Critical Kuraray Co Ltd
Priority to JP62165004A priority Critical patent/JP2571788B2/en
Publication of JPS649447A publication Critical patent/JPS649447A/en
Application granted granted Critical
Publication of JP2571788B2 publication Critical patent/JP2571788B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

PURPOSE:To improve solvent resistance of a pattern by using a specified photoreactive crosslinking resin compsn. CONSTITUTION:A photoreactive crosslinking resin compsn. consists of a polymer (e.g. polyvinyl cinnamate) having crosslinking functional groups and photoreactive functional groups, and a low molecular compd. (e.g. methyl cinnamate) which can cause photoreaction with the afore-mentioned polymer. After forming a thin film 1 from said compsn. on a substrate 2, the thin film is exposed through a photomask 3 to cause a reaction in the film 11 at the exposed part. Then, the low molecular compd. 111 at the unexposed part is removed under reduced pressure and/or by heating to cause decrease of its volume. The whole body of the film is crosslinked by exposing the whole surface of the film simultaneously or after decreasing the volume. Thus, a pattern 13 is formed. By this process, gratings or lenses having high solvent resistance are formed in large amt. inexpensively.
JP62165004A 1987-06-30 1987-06-30 Pattern formation method Expired - Fee Related JP2571788B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62165004A JP2571788B2 (en) 1987-06-30 1987-06-30 Pattern formation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62165004A JP2571788B2 (en) 1987-06-30 1987-06-30 Pattern formation method

Publications (2)

Publication Number Publication Date
JPS649447A true JPS649447A (en) 1989-01-12
JP2571788B2 JP2571788B2 (en) 1997-01-16

Family

ID=15804014

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62165004A Expired - Fee Related JP2571788B2 (en) 1987-06-30 1987-06-30 Pattern formation method

Country Status (1)

Country Link
JP (1) JP2571788B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002296407A (en) * 2001-03-30 2002-10-09 Hitachi Chem Co Ltd Method for forming recess and projection, optical film which uses the same and its use

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5416203A (en) * 1977-07-07 1979-02-06 Nippon Paint Co Ltd Dry making method of photosensitive resin plate
JPS57186754A (en) * 1981-05-07 1982-11-17 Du Pont Surface treatment of printing plate
JPS59214851A (en) * 1983-05-20 1984-12-04 Rikagaku Kenkyusho Manufacture of dry type lithography pattern
JPS60166946A (en) * 1983-10-14 1985-08-30 Kyowa Gas Chem Ind Co Ltd Photosensitive resin composition and formation of pattern having refractive index difference by using it
JPS6295526A (en) * 1985-10-22 1987-05-02 Kuraray Co Ltd Photosensitive resin composition and method for preparing pattern using the composition
JPS6295525A (en) * 1985-10-22 1987-05-02 Kuraray Co Ltd Photosensitive resin composition and method for preparing pattern using the composition

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5416203A (en) * 1977-07-07 1979-02-06 Nippon Paint Co Ltd Dry making method of photosensitive resin plate
JPS57186754A (en) * 1981-05-07 1982-11-17 Du Pont Surface treatment of printing plate
JPS59214851A (en) * 1983-05-20 1984-12-04 Rikagaku Kenkyusho Manufacture of dry type lithography pattern
JPS60166946A (en) * 1983-10-14 1985-08-30 Kyowa Gas Chem Ind Co Ltd Photosensitive resin composition and formation of pattern having refractive index difference by using it
JPS6295526A (en) * 1985-10-22 1987-05-02 Kuraray Co Ltd Photosensitive resin composition and method for preparing pattern using the composition
JPS6295525A (en) * 1985-10-22 1987-05-02 Kuraray Co Ltd Photosensitive resin composition and method for preparing pattern using the composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002296407A (en) * 2001-03-30 2002-10-09 Hitachi Chem Co Ltd Method for forming recess and projection, optical film which uses the same and its use

Also Published As

Publication number Publication date
JP2571788B2 (en) 1997-01-16

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees