JPH0371705B2 - - Google Patents

Info

Publication number
JPH0371705B2
JPH0371705B2 JP19206283A JP19206283A JPH0371705B2 JP H0371705 B2 JPH0371705 B2 JP H0371705B2 JP 19206283 A JP19206283 A JP 19206283A JP 19206283 A JP19206283 A JP 19206283A JP H0371705 B2 JPH0371705 B2 JP H0371705B2
Authority
JP
Japan
Prior art keywords
polymer
photosensitive resin
resin composition
dimethylallyl
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP19206283A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60166946A (ja
Inventor
Isamu Kato
Kozo Nakao
Kyoshi Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kuraray Co Ltd
Original Assignee
Kuraray Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kuraray Co Ltd filed Critical Kuraray Co Ltd
Priority to JP19206283A priority Critical patent/JPS60166946A/ja
Publication of JPS60166946A publication Critical patent/JPS60166946A/ja
Publication of JPH0371705B2 publication Critical patent/JPH0371705B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Integrated Circuits (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP19206283A 1983-10-14 1983-10-14 感光性樹脂組成物およびそれを用いる屈折率差を有するパタ−ンの作成方法 Granted JPS60166946A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19206283A JPS60166946A (ja) 1983-10-14 1983-10-14 感光性樹脂組成物およびそれを用いる屈折率差を有するパタ−ンの作成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19206283A JPS60166946A (ja) 1983-10-14 1983-10-14 感光性樹脂組成物およびそれを用いる屈折率差を有するパタ−ンの作成方法

Publications (2)

Publication Number Publication Date
JPS60166946A JPS60166946A (ja) 1985-08-30
JPH0371705B2 true JPH0371705B2 (enrdf_load_stackoverflow) 1991-11-14

Family

ID=16284984

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19206283A Granted JPS60166946A (ja) 1983-10-14 1983-10-14 感光性樹脂組成物およびそれを用いる屈折率差を有するパタ−ンの作成方法

Country Status (1)

Country Link
JP (1) JPS60166946A (enrdf_load_stackoverflow)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0220652B1 (en) * 1985-10-22 1994-02-02 Kuraray Co., Ltd. Method for manufacturing phase gratings of a combination pattern-refraction modification type
JPS6295526A (ja) * 1985-10-22 1987-05-02 Kuraray Co Ltd 感光性樹脂組成物およびそれを用いたパタ−ンの作製法
JPH07101246B2 (ja) * 1987-03-07 1995-11-01 株式会社クラレ 形態屈折率双変調型導波路レンズ
JP2537883B2 (ja) * 1987-06-30 1996-09-25 株式会社クラレ パタ−ン形成方法
JP2571788B2 (ja) * 1987-06-30 1997-01-16 株式会社クラレ パタ−ン形成法
JPH081487B2 (ja) * 1988-05-31 1996-01-10 松下電器産業株式会社 屈折率差のあるパターンを具備した光学素子の作成方法及びそれに供するパターン転写体と像形成体
JPH0315070A (ja) * 1989-03-08 1991-01-23 Kuraray Co Ltd 感光性樹脂組成物、それを用いたパターンおよびパターン作製法
JPH031145A (ja) * 1989-05-29 1991-01-07 Kuraray Co Ltd 感光性樹脂組成物、それを用いたパターンおよびパターン作製法
JP2622185B2 (ja) * 1990-06-28 1997-06-18 シャープ株式会社 カラー液晶表示装置
KR101526618B1 (ko) 2007-05-11 2015-06-05 바스프 에스이 옥심 에스테르 광개시제
WO2008138732A1 (en) 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
TWI520940B (zh) 2010-10-05 2016-02-11 巴地斯顏料化工廠 肟酯
CN103998427A (zh) 2011-12-07 2014-08-20 巴斯夫欧洲公司 肟酯光敏引发剂
EP2963014B1 (en) 2012-05-09 2017-09-13 Basf Se Oxime ester photoinitiators
JP6469669B2 (ja) 2013-07-08 2019-02-13 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ オキシムエステル光開始剤
CN105531260B (zh) 2013-09-10 2019-05-31 巴斯夫欧洲公司 肟酯光引发剂
US20220121113A1 (en) 2019-01-23 2022-04-21 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
JP7703554B2 (ja) 2020-03-04 2025-07-07 ベーアーエスエフ・エスエー オキシムエステル光開始剤

Also Published As

Publication number Publication date
JPS60166946A (ja) 1985-08-30

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