JPS60140763U - プラズマ装置 - Google Patents

プラズマ装置

Info

Publication number
JPS60140763U
JPS60140763U JP2562784U JP2562784U JPS60140763U JP S60140763 U JPS60140763 U JP S60140763U JP 2562784 U JP2562784 U JP 2562784U JP 2562784 U JP2562784 U JP 2562784U JP S60140763 U JPS60140763 U JP S60140763U
Authority
JP
Japan
Prior art keywords
evacuated chamber
electrode
plasma equipment
coil
high frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2562784U
Other languages
English (en)
Japanese (ja)
Other versions
JPS629324Y2 (enExample
Inventor
金田一　要三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP2562784U priority Critical patent/JPS60140763U/ja
Publication of JPS60140763U publication Critical patent/JPS60140763U/ja
Application granted granted Critical
Publication of JPS629324Y2 publication Critical patent/JPS629324Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
JP2562784U 1984-02-24 1984-02-24 プラズマ装置 Granted JPS60140763U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2562784U JPS60140763U (ja) 1984-02-24 1984-02-24 プラズマ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2562784U JPS60140763U (ja) 1984-02-24 1984-02-24 プラズマ装置

Publications (2)

Publication Number Publication Date
JPS60140763U true JPS60140763U (ja) 1985-09-18
JPS629324Y2 JPS629324Y2 (enExample) 1987-03-04

Family

ID=30520864

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2562784U Granted JPS60140763U (ja) 1984-02-24 1984-02-24 プラズマ装置

Country Status (1)

Country Link
JP (1) JPS60140763U (enExample)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3971684A (en) * 1973-12-03 1976-07-27 Hewlett-Packard Company Etching thin film circuits and semiconductor chips
JPS53114679A (en) * 1977-03-17 1978-10-06 Fujitsu Ltd Plasm etching unit

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3971684A (en) * 1973-12-03 1976-07-27 Hewlett-Packard Company Etching thin film circuits and semiconductor chips
JPS53114679A (en) * 1977-03-17 1978-10-06 Fujitsu Ltd Plasm etching unit

Also Published As

Publication number Publication date
JPS629324Y2 (enExample) 1987-03-04

Similar Documents

Publication Publication Date Title
JPS60140763U (ja) プラズマ装置
JPS62148570U (enExample)
JPS5983971U (ja) イオンプレ−テイング装置
JPS59187136U (ja) 半導体薄膜形成装置
JPS5928949U (ja) 陰極線管の製造装置
JPS5986700U (ja) プラズマ装置用放電々極
JPS61188352U (enExample)
JPS5969965U (ja) グロ−放電発生装置
JPS58160262U (ja) Ｇｄ−ｃｖｄ装置
JPS5951061U (ja) 高周波イオン・プレ−テイング装置
JPS6013740U (ja) 試料保持装置
JPS5969964U (ja) 成膜装置
JPS6220227A (ja) イオン源
JPS58151666U (ja) プラズマ・エツチング装置
JPS5969966U (ja) グロ−放電発生装置
JPS6274332U (enExample)
JPS5944770U (ja) プラズマｃｖｄ装置
JPS59103756U (ja) 高周波プラズマ励起用電極
JPS6351436U (enExample)
JPS5965498U (ja) 高周波加熱装置
JPS6292550U (enExample)
JPS6319745U (enExample)
JPS6214724U (enExample)
JPS592132U (ja) プラズマｃｖｄ装置
JPS6142831U (ja) 半導体製造装置