JPS5996261A - 薄膜作成装置 - Google Patents

薄膜作成装置

Info

Publication number
JPS5996261A
JPS5996261A JP20473782A JP20473782A JPS5996261A JP S5996261 A JPS5996261 A JP S5996261A JP 20473782 A JP20473782 A JP 20473782A JP 20473782 A JP20473782 A JP 20473782A JP S5996261 A JPS5996261 A JP S5996261A
Authority
JP
Japan
Prior art keywords
electrode
magnetic field
reactive gas
thin film
ionization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20473782A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6411116B2 (enrdf_load_stackoverflow
Inventor
Saburo Tabata
田畑　三郎
Yoshiyuki Sato
義幸 佐藤
Hideo Hayashi
英雄 林
Yasushi Kawashita
安司 川下
Masami Nakasone
正美 中曽根
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Shinko Seiki Co Ltd
Original Assignee
Agency of Industrial Science and Technology
Shinko Seiki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Shinko Seiki Co Ltd filed Critical Agency of Industrial Science and Technology
Priority to JP20473782A priority Critical patent/JPS5996261A/ja
Publication of JPS5996261A publication Critical patent/JPS5996261A/ja
Publication of JPS6411116B2 publication Critical patent/JPS6411116B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP20473782A 1982-11-22 1982-11-22 薄膜作成装置 Granted JPS5996261A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20473782A JPS5996261A (ja) 1982-11-22 1982-11-22 薄膜作成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20473782A JPS5996261A (ja) 1982-11-22 1982-11-22 薄膜作成装置

Publications (2)

Publication Number Publication Date
JPS5996261A true JPS5996261A (ja) 1984-06-02
JPS6411116B2 JPS6411116B2 (enrdf_load_stackoverflow) 1989-02-23

Family

ID=16495473

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20473782A Granted JPS5996261A (ja) 1982-11-22 1982-11-22 薄膜作成装置

Country Status (1)

Country Link
JP (1) JPS5996261A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6328873A (ja) * 1986-07-22 1988-02-06 Ulvac Corp プラズマｃｖｄ装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51112441A (en) * 1975-03-28 1976-10-04 Matsushita Electric Ind Co Ltd Ionization plating device
JPS5420973A (en) * 1977-07-18 1979-02-16 Nippon Telegr & Teleph Corp <Ntt> Inorganic compound thin film forming device
JPS5443187A (en) * 1977-09-12 1979-04-05 Osaka Kouon Denki Kk Ionization method
JPS5452685A (en) * 1978-05-12 1979-04-25 Canon Inc Vacuum ionization plating method
JPS55172370U (enrdf_load_stackoverflow) * 1979-05-23 1980-12-10

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51112441A (en) * 1975-03-28 1976-10-04 Matsushita Electric Ind Co Ltd Ionization plating device
JPS5420973A (en) * 1977-07-18 1979-02-16 Nippon Telegr & Teleph Corp <Ntt> Inorganic compound thin film forming device
JPS5443187A (en) * 1977-09-12 1979-04-05 Osaka Kouon Denki Kk Ionization method
JPS5452685A (en) * 1978-05-12 1979-04-25 Canon Inc Vacuum ionization plating method
JPS55172370U (enrdf_load_stackoverflow) * 1979-05-23 1980-12-10

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6328873A (ja) * 1986-07-22 1988-02-06 Ulvac Corp プラズマｃｖｄ装置

Also Published As

Publication number Publication date
JPS6411116B2 (enrdf_load_stackoverflow) 1989-02-23

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