JPH0227432B2 - - Google Patents
Info
- Publication number
- JPH0227432B2 JPH0227432B2 JP59274500A JP27450084A JPH0227432B2 JP H0227432 B2 JPH0227432 B2 JP H0227432B2 JP 59274500 A JP59274500 A JP 59274500A JP 27450084 A JP27450084 A JP 27450084A JP H0227432 B2 JPH0227432 B2 JP H0227432B2
- Authority
- JP
- Japan
- Prior art keywords
- ionization
- filament
- evaporation source
- repeller
- vapor flow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001704 evaporation Methods 0.000 claims description 15
- 230000008020 evaporation Effects 0.000 claims description 15
- 230000007935 neutral effect Effects 0.000 claims description 9
- 230000001678 irradiating effect Effects 0.000 claims 1
- 150000002500 ions Chemical class 0.000 description 21
- 239000000758 substrate Substances 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 6
- 230000001133 acceleration Effects 0.000 description 4
- 238000010884 ion-beam technique Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005315 distribution function Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000002784 hot electron Substances 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Microwave Tubes (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59274500A JPS61157676A (ja) | 1984-12-28 | 1984-12-28 | イオン化機構 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59274500A JPS61157676A (ja) | 1984-12-28 | 1984-12-28 | イオン化機構 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61157676A JPS61157676A (ja) | 1986-07-17 |
JPH0227432B2 true JPH0227432B2 (enrdf_load_stackoverflow) | 1990-06-18 |
Family
ID=17542553
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59274500A Granted JPS61157676A (ja) | 1984-12-28 | 1984-12-28 | イオン化機構 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61157676A (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2719528B2 (ja) * | 1988-07-14 | 1998-02-25 | 東京エレクトロン株式会社 | イオン注入装置 |
JP2011041947A (ja) * | 2003-11-25 | 2011-03-03 | Panasonic Electric Works Co Ltd | 改質方法および改質装置 |
JP4416632B2 (ja) | 2004-12-03 | 2010-02-17 | キヤノン株式会社 | ガスクラスターイオンビーム照射装置およびガスクラスターのイオン化方法 |
-
1984
- 1984-12-28 JP JP59274500A patent/JPS61157676A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS61157676A (ja) | 1986-07-17 |
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