JPS6411116B2 - - Google Patents
Info
- Publication number
- JPS6411116B2 JPS6411116B2 JP20473782A JP20473782A JPS6411116B2 JP S6411116 B2 JPS6411116 B2 JP S6411116B2 JP 20473782 A JP20473782 A JP 20473782A JP 20473782 A JP20473782 A JP 20473782A JP S6411116 B2 JPS6411116 B2 JP S6411116B2
- Authority
- JP
- Japan
- Prior art keywords
- processed
- ionization electrode
- electrode
- vacuum chamber
- ionization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000012495 reaction gas Substances 0.000 claims description 18
- 239000010409 thin film Substances 0.000 claims description 16
- 230000005684 electric field Effects 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 3
- 239000007789 gas Substances 0.000 description 15
- 239000010408 film Substances 0.000 description 7
- 230000008020 evaporation Effects 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 238000007733 ion plating Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 239000013077 target material Substances 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000012788 optical film Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 238000005546 reactive sputtering Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910021385 hard carbon Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20473782A JPS5996261A (ja) | 1982-11-22 | 1982-11-22 | 薄膜作成装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20473782A JPS5996261A (ja) | 1982-11-22 | 1982-11-22 | 薄膜作成装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5996261A JPS5996261A (ja) | 1984-06-02 |
| JPS6411116B2 true JPS6411116B2 (enrdf_load_stackoverflow) | 1989-02-23 |
Family
ID=16495473
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20473782A Granted JPS5996261A (ja) | 1982-11-22 | 1982-11-22 | 薄膜作成装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5996261A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6328873A (ja) * | 1986-07-22 | 1988-02-06 | Ulvac Corp | プラズマｃｖｄ装置 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS589156B2 (ja) * | 1975-03-28 | 1983-02-19 | 松下電器産業株式会社 | イオン化プレ−テイング装置 |
| JPS5420973A (en) * | 1977-07-18 | 1979-02-16 | Nippon Telegr & Teleph Corp <Ntt> | Inorganic compound thin film forming device |
| JPS585985B2 (ja) * | 1977-09-12 | 1983-02-02 | 光音電気株式会社 | イオン化方法 |
| JPS5452685A (en) * | 1978-05-12 | 1979-04-25 | Canon Inc | Vacuum ionization plating method |
| JPS594045Y2 (ja) * | 1979-05-23 | 1984-02-04 | 神港精機株式会社 | 薄膜生成用イオン化装置 |
-
1982
- 1982-11-22 JP JP20473782A patent/JPS5996261A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5996261A (ja) | 1984-06-02 |
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