JPS5994815A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS5994815A
JPS5994815A JP57204819A JP20481982A JPS5994815A JP S5994815 A JPS5994815 A JP S5994815A JP 57204819 A JP57204819 A JP 57204819A JP 20481982 A JP20481982 A JP 20481982A JP S5994815 A JPS5994815 A JP S5994815A
Authority
JP
Japan
Prior art keywords
substrate
compound semiconductor
gaas substrate
crystal
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57204819A
Other languages
English (en)
Japanese (ja)
Other versions
JPH023297B2 (https=
Inventor
Kuninori Kitahara
邦紀 北原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57204819A priority Critical patent/JPS5994815A/ja
Publication of JPS5994815A publication Critical patent/JPS5994815A/ja
Publication of JPH023297B2 publication Critical patent/JPH023297B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P30/00—Ion implantation into wafers, substrates or parts of devices
    • H10P30/20—Ion implantation into wafers, substrates or parts of devices into semiconductor materials, e.g. for doping

Landscapes

  • Junction Field-Effect Transistors (AREA)
JP57204819A 1982-11-22 1982-11-22 半導体装置の製造方法 Granted JPS5994815A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57204819A JPS5994815A (ja) 1982-11-22 1982-11-22 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57204819A JPS5994815A (ja) 1982-11-22 1982-11-22 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS5994815A true JPS5994815A (ja) 1984-05-31
JPH023297B2 JPH023297B2 (https=) 1990-01-23

Family

ID=16496902

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57204819A Granted JPS5994815A (ja) 1982-11-22 1982-11-22 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS5994815A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0276224A (ja) * 1988-09-10 1990-03-15 Fujitsu Ltd 化合物半導体装置の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5882575A (ja) * 1981-11-11 1983-05-18 Nippon Telegr & Teleph Corp <Ntt> 半導体基板の製法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5882575A (ja) * 1981-11-11 1983-05-18 Nippon Telegr & Teleph Corp <Ntt> 半導体基板の製法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0276224A (ja) * 1988-09-10 1990-03-15 Fujitsu Ltd 化合物半導体装置の製造方法

Also Published As

Publication number Publication date
JPH023297B2 (https=) 1990-01-23

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