JPS5988829A - フオトレジストの除去方法 - Google Patents

フオトレジストの除去方法

Info

Publication number
JPS5988829A
JPS5988829A JP57199214A JP19921482A JPS5988829A JP S5988829 A JPS5988829 A JP S5988829A JP 57199214 A JP57199214 A JP 57199214A JP 19921482 A JP19921482 A JP 19921482A JP S5988829 A JPS5988829 A JP S5988829A
Authority
JP
Japan
Prior art keywords
photoresist
acetate
substrate
organic solvent
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57199214A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0113217B2 (enExample
Inventor
Katsunori Nishii
勝則 西井
Takeshi Konuma
小沼　毅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP57199214A priority Critical patent/JPS5988829A/ja
Publication of JPS5988829A publication Critical patent/JPS5988829A/ja
Publication of JPH0113217B2 publication Critical patent/JPH0113217B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P50/00—

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57199214A 1982-11-12 1982-11-12 フオトレジストの除去方法 Granted JPS5988829A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57199214A JPS5988829A (ja) 1982-11-12 1982-11-12 フオトレジストの除去方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57199214A JPS5988829A (ja) 1982-11-12 1982-11-12 フオトレジストの除去方法

Publications (2)

Publication Number Publication Date
JPS5988829A true JPS5988829A (ja) 1984-05-22
JPH0113217B2 JPH0113217B2 (enExample) 1989-03-03

Family

ID=16404026

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57199214A Granted JPS5988829A (ja) 1982-11-12 1982-11-12 フオトレジストの除去方法

Country Status (1)

Country Link
JP (1) JPS5988829A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030046868A (ko) * 2001-12-07 2003-06-18 주식회사 덕성 유기막 제거용 시너
CN121348678A (zh) * 2025-12-22 2026-01-16 合肥晶合集成电路股份有限公司 光阻的去除方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS592043A (ja) * 1982-06-29 1984-01-07 Fujitsu Ltd フオトレジストの現像方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS592043A (ja) * 1982-06-29 1984-01-07 Fujitsu Ltd フオトレジストの現像方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030046868A (ko) * 2001-12-07 2003-06-18 주식회사 덕성 유기막 제거용 시너
CN121348678A (zh) * 2025-12-22 2026-01-16 合肥晶合集成电路股份有限公司 光阻的去除方法

Also Published As

Publication number Publication date
JPH0113217B2 (enExample) 1989-03-03

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