JPS5984580A - 超短ゲ−ト電界効果トランジスタ - Google Patents
超短ゲ−ト電界効果トランジスタInfo
- Publication number
- JPS5984580A JPS5984580A JP57194582A JP19458282A JPS5984580A JP S5984580 A JPS5984580 A JP S5984580A JP 57194582 A JP57194582 A JP 57194582A JP 19458282 A JP19458282 A JP 19458282A JP S5984580 A JPS5984580 A JP S5984580A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor
- type
- semiconductors
- mentioned
- semi
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
Landscapes
- Bipolar Transistors (AREA)
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57194582A JPS5984580A (ja) | 1982-11-08 | 1982-11-08 | 超短ゲ−ト電界効果トランジスタ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57194582A JPS5984580A (ja) | 1982-11-08 | 1982-11-08 | 超短ゲ−ト電界効果トランジスタ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5984580A true JPS5984580A (ja) | 1984-05-16 |
| JPS6255316B2 JPS6255316B2 (enExample) | 1987-11-19 |
Family
ID=16326938
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57194582A Granted JPS5984580A (ja) | 1982-11-08 | 1982-11-08 | 超短ゲ−ト電界効果トランジスタ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5984580A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4771324A (en) * | 1982-09-24 | 1988-09-13 | Fujitsu Limited | Heterojunction field effect device having an implanted region within a device channel |
| US5444016A (en) * | 1993-06-25 | 1995-08-22 | Abrokwah; Jonathan K. | Method of making ohmic contacts to a complementary III-V semiconductor device |
| US5606184A (en) * | 1995-05-04 | 1997-02-25 | Motorola, Inc. | Heterostructure field effect device having refractory ohmic contact directly on channel layer and method for making |
-
1982
- 1982-11-08 JP JP57194582A patent/JPS5984580A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4771324A (en) * | 1982-09-24 | 1988-09-13 | Fujitsu Limited | Heterojunction field effect device having an implanted region within a device channel |
| US5444016A (en) * | 1993-06-25 | 1995-08-22 | Abrokwah; Jonathan K. | Method of making ohmic contacts to a complementary III-V semiconductor device |
| US5606184A (en) * | 1995-05-04 | 1997-02-25 | Motorola, Inc. | Heterostructure field effect device having refractory ohmic contact directly on channel layer and method for making |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6255316B2 (enExample) | 1987-11-19 |
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