JPS598358Y2 - 半導体素子パツケ−ジ - Google Patents
半導体素子パツケ−ジInfo
- Publication number
- JPS598358Y2 JPS598358Y2 JP1978015340U JP1534078U JPS598358Y2 JP S598358 Y2 JPS598358 Y2 JP S598358Y2 JP 1978015340 U JP1978015340 U JP 1978015340U JP 1534078 U JP1534078 U JP 1534078U JP S598358 Y2 JPS598358 Y2 JP S598358Y2
- Authority
- JP
- Japan
- Prior art keywords
- metal layer
- semiconductor device
- substrate
- semiconductor element
- gold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
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- H01L23/053—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having an insulating or insulated base as a mounting for the semiconductor body
- H01L23/057—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having an insulating or insulated base as a mounting for the semiconductor body the leads being parallel to the base
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Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Die Bonding (AREA)
- Wire Bonding (AREA)
Description
【考案の詳細な説明】
本考案は半導体素子パッケージに関し、より詳細には半
導体素子載置部の改良に関する。
導体素子載置部の改良に関する。
従来の半導体素子パッケージは第1図に示すように耐熱
性絶縁物質より戊る基板1の内底部に金から戊る金属層
2を形或して、その上に半導体素子aを載置し、該素子
3を形或しているシリコンと金属層2の金とで金一シリ
コンの共晶反応を起させて素子3を基板1に強固に固着
している。
性絶縁物質より戊る基板1の内底部に金から戊る金属層
2を形或して、その上に半導体素子aを載置し、該素子
3を形或しているシリコンと金属層2の金とで金一シリ
コンの共晶反応を起させて素子3を基板1に強固に固着
している。
そして素子3の各電極はアルミニウム細線5を介して外
部リード4と、あるいは共通接地をとるために金属層2
と接続され、その後にキャップ部材6がガラスや樹脂等
の封止部材7により基板1上に接着され、内部を完全に
気密封止している。
部リード4と、あるいは共通接地をとるために金属層2
と接続され、その後にキャップ部材6がガラスや樹脂等
の封止部材7により基板1上に接着され、内部を完全に
気密封止している。
しかしながら、このパッケージに於では気密封止する時
の封止部材の加熱操作により素子の共通接地を行ってい
るアルミニウム細線5と金属層2の接合部でパープルプ
レイグが起こり、その接合部分でアルミニウム細線が断
熱あるいは接触不良を起こし、半導体装置として正常な
動作をしないと゛いう欠点を有していた。
の封止部材の加熱操作により素子の共通接地を行ってい
るアルミニウム細線5と金属層2の接合部でパープルプ
レイグが起こり、その接合部分でアルミニウム細線が断
熱あるいは接触不良を起こし、半導体装置として正常な
動作をしないと゛いう欠点を有していた。
このパープルプレイグを改良する方法としてアルミニウ
ム細線と接合性が良く、加熱によってもパープルプレイ
グが発生しないAg−Pd,Ag−Pd−Pt等の金属
を金属層2として使用することも考えられるがこれらの
金属では素子3のシリコンと共晶反応を生じないために
素子3を基板1に固着するための別途の工程が必要とな
る付加的な欠点を有することになる。
ム細線と接合性が良く、加熱によってもパープルプレイ
グが発生しないAg−Pd,Ag−Pd−Pt等の金属
を金属層2として使用することも考えられるがこれらの
金属では素子3のシリコンと共晶反応を生じないために
素子3を基板1に固着するための別途の工程が必要とな
る付加的な欠点を有することになる。
本考案は上記諸欠点に鑑み案出されたもので、以下第2
図及び第3図に基づいて説明する。
図及び第3図に基づいて説明する。
尚、図中、従来例と同一部分には同一符号を付す。
本考案の半導体素子パッケージは耐熱性絶縁物質、例え
ばセラミックより戊る基板1の内底部に金から戊る金属
層2′とアルミニウム細線5が接合しやすい金属、例え
ばAg−Pd.Ag−Pd−Pt等の金属層2″とを併
設し、その一部A(第3図参照)を接触させており、素
子3は従来と同様に金属から戒る金属層2′上に載置さ
れ、素子3を形戊しているシリコン基体と金属層2′の
金とで共晶反応を起させて基板1に強固に固着される。
ばセラミックより戊る基板1の内底部に金から戊る金属
層2′とアルミニウム細線5が接合しやすい金属、例え
ばAg−Pd.Ag−Pd−Pt等の金属層2″とを併
設し、その一部A(第3図参照)を接触させており、素
子3は従来と同様に金属から戒る金属層2′上に載置さ
れ、素子3を形戊しているシリコン基体と金属層2′の
金とで共晶反応を起させて基板1に強固に固着される。
本考案においては素子3の電極を共通接地するためのア
ルミニュム細線5を基板1の金属層2″に例えば超音波
ボンデイング等のボンテ゛イング手法により接合される
。
ルミニュム細線5を基板1の金属層2″に例えば超音波
ボンデイング等のボンテ゛イング手法により接合される
。
尚、共通接地とするために本実施例では金属層2′,2
″を端縁の一部Aで接触させているが、両金属層の端縁
のすべて或いは複数個所で接触させることも可能である
。
″を端縁の一部Aで接触させているが、両金属層の端縁
のすべて或いは複数個所で接触させることも可能である
。
そして素子3の電極と外部リード4の接続及び素子3の
共通接地が完了後、キャップ部材6が封止部材7を介し
て基板1に固着され、内部が完全に気密封止される。
共通接地が完了後、キャップ部材6が封止部材7を介し
て基板1に固着され、内部が完全に気密封止される。
以上のように本考案の半導体パッケージによれば素子3
が載置される部分には金の金属層が配置されているため
半導体素子を共晶反応により基板に強固に固着できると
いう従来技術による利点を喪失することなく、シかも半
導体素子の電極を共通接地するためのアルミニウム細線
が接続される部分に、Ag−Pd,Ag−Pd−Pt等
の金属層が配置されている為、アルミニウムと接合性が
良く、気密封止時の加熱操作によるパープルプレイグの
発生が解消され、半導体装置として極めて信頼性の高い
ものを得ることができる。
が載置される部分には金の金属層が配置されているため
半導体素子を共晶反応により基板に強固に固着できると
いう従来技術による利点を喪失することなく、シかも半
導体素子の電極を共通接地するためのアルミニウム細線
が接続される部分に、Ag−Pd,Ag−Pd−Pt等
の金属層が配置されている為、アルミニウムと接合性が
良く、気密封止時の加熱操作によるパープルプレイグの
発生が解消され、半導体装置として極めて信頼性の高い
ものを得ることができる。
第1図は従来の半導体装置の断面図、第2図は本考案の
半導体装置の断面図、第3図は本考案の基板1の平面図
である。 1:耐熱性絶縁基板、2.2’,2″:金属層、5:ア
ルミニウム細線。
半導体装置の断面図、第3図は本考案の基板1の平面図
である。 1:耐熱性絶縁基板、2.2’,2″:金属層、5:ア
ルミニウム細線。
Claims (1)
- 半導体素子載置部に、金よりなる第1の金属層を設ける
と共に、半導体素子の電極を共通接地するために用いら
れるアルミニウム細線と接合性の良好な銀を含む第2の
金属層を、前記第1の金属層と電気的に接続するように
設けて或るMOS型半導体素子パッケージ。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1978015340U JPS598358Y2 (ja) | 1978-02-08 | 1978-02-08 | 半導体素子パツケ−ジ |
US06/010,623 US4229758A (en) | 1978-02-08 | 1979-02-09 | Package for semiconductor devices with first and second metal layers on the substrate of said package |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1978015340U JPS598358Y2 (ja) | 1978-02-08 | 1978-02-08 | 半導体素子パツケ−ジ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54120368U JPS54120368U (ja) | 1979-08-23 |
JPS598358Y2 true JPS598358Y2 (ja) | 1984-03-15 |
Family
ID=11886050
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1978015340U Expired JPS598358Y2 (ja) | 1978-02-08 | 1978-02-08 | 半導体素子パツケ−ジ |
Country Status (2)
Country | Link |
---|---|
US (1) | US4229758A (ja) |
JP (1) | JPS598358Y2 (ja) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4486945A (en) * | 1981-04-21 | 1984-12-11 | Seiichiro Aigoo | Method of manufacturing semiconductor device with plated bump |
JPS58169942A (ja) * | 1982-03-29 | 1983-10-06 | Fujitsu Ltd | 半導体装置 |
US4929516A (en) * | 1985-03-14 | 1990-05-29 | Olin Corporation | Semiconductor die attach system |
US4868639A (en) * | 1986-08-11 | 1989-09-19 | Fujitsu Limited | Semiconductor device having waveguide-coaxial line transformation structure |
US4978052A (en) * | 1986-11-07 | 1990-12-18 | Olin Corporation | Semiconductor die attach system |
US4872047A (en) * | 1986-11-07 | 1989-10-03 | Olin Corporation | Semiconductor die attach system |
US5126511A (en) * | 1989-06-13 | 1992-06-30 | Texas Instruments Incorporated | Copper cored enclosures for hybrid circuits |
US5317107A (en) * | 1992-09-24 | 1994-05-31 | Motorola, Inc. | Shielded stripline configuration semiconductor device and method for making the same |
JP3515141B2 (ja) * | 1993-05-18 | 2004-04-05 | 株式会社東芝 | 半導体パッケージ |
US5532513A (en) * | 1994-07-08 | 1996-07-02 | Johnson Matthey Electronics, Inc. | Metal-ceramic composite lid |
US20030112710A1 (en) * | 2001-12-18 | 2003-06-19 | Eidson John C. | Reducing thermal drift in electronic components |
US8405200B2 (en) * | 2007-05-29 | 2013-03-26 | Kyocera Corporation | Electronic-component-housing package and electronic device |
FR3066643B1 (fr) * | 2017-05-16 | 2020-03-13 | Stmicroelectronics (Grenoble 2) Sas | Boitier electronique pourvu d'une fente locale formant un event |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3340347A (en) * | 1964-10-12 | 1967-09-05 | Corning Glass Works | Enclosed electronic device |
US3634600A (en) * | 1969-07-22 | 1972-01-11 | Ceramic Metal Systems Inc | Ceramic package |
US3617819A (en) * | 1970-10-15 | 1971-11-02 | Sylvania Electric Prod | A semiconductor device having a connecting pad of low resistivity semiconductor material interconnecting gold electrodes and aluminum contacts of an enclosure |
US3681513A (en) * | 1971-01-26 | 1972-08-01 | American Lava Corp | Hermetic power package |
US3697666A (en) * | 1971-09-24 | 1972-10-10 | Diacon | Enclosure for incapsulating electronic components |
US4032350A (en) * | 1973-03-12 | 1977-06-28 | Owens-Illinois, Inc. | Printing paste vehicle, gold dispensing paste and method of using the paste in the manufacture of microelectronic circuitry components |
US3898594A (en) * | 1973-11-02 | 1975-08-05 | Trw Inc | Microwave semiconductor device package |
JPS5237744A (en) * | 1975-09-19 | 1977-03-23 | Seiko Epson Corp | Electronic desk computer with liquid crystal display |
US4092664A (en) * | 1976-02-17 | 1978-05-30 | Hughes Aircraft Company | Carrier for mounting a semiconductor chip |
US4142203A (en) * | 1976-12-20 | 1979-02-27 | Avx Corporation | Method of assembling a hermetically sealed semiconductor unit |
-
1978
- 1978-02-08 JP JP1978015340U patent/JPS598358Y2/ja not_active Expired
-
1979
- 1979-02-09 US US06/010,623 patent/US4229758A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US4229758A (en) | 1980-10-21 |
JPS54120368U (ja) | 1979-08-23 |
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