JPS5961106A - 磁気記憶体 - Google Patents
磁気記憶体Info
- Publication number
- JPS5961106A JPS5961106A JP57171694A JP17169482A JPS5961106A JP S5961106 A JPS5961106 A JP S5961106A JP 57171694 A JP57171694 A JP 57171694A JP 17169482 A JP17169482 A JP 17169482A JP S5961106 A JPS5961106 A JP S5961106A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- alloy
- coated
- medium
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 39
- 239000010409 thin film Substances 0.000 claims abstract description 34
- 239000010408 film Substances 0.000 claims abstract description 22
- 230000001681 protective effect Effects 0.000 claims abstract description 14
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 11
- 239000000956 alloy Substances 0.000 claims abstract description 11
- 239000010941 cobalt Substances 0.000 claims abstract description 10
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910001004 magnetic alloy Inorganic materials 0.000 claims abstract description 10
- 239000000758 substrate Substances 0.000 claims abstract description 7
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 claims abstract description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 35
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 20
- 229910052759 nickel Inorganic materials 0.000 claims description 18
- 229910052697 platinum Inorganic materials 0.000 claims description 17
- 229910052742 iron Inorganic materials 0.000 claims description 10
- 229910017052 cobalt Inorganic materials 0.000 claims description 8
- 229910044991 metal oxide Inorganic materials 0.000 claims description 5
- 150000004706 metal oxides Chemical class 0.000 claims description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- UCNNJGDEJXIUCC-UHFFFAOYSA-L hydroxy(oxo)iron;iron Chemical compound [Fe].O[Fe]=O.O[Fe]=O UCNNJGDEJXIUCC-UHFFFAOYSA-L 0.000 claims description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical group O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 4
- 150000004767 nitrides Chemical class 0.000 claims description 3
- 229910000521 B alloy Inorganic materials 0.000 claims description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 2
- 229910001339 C alloy Inorganic materials 0.000 claims description 2
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 229910052796 boron Inorganic materials 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 229910052741 iridium Inorganic materials 0.000 claims description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052748 manganese Inorganic materials 0.000 claims description 2
- 239000011572 manganese Substances 0.000 claims description 2
- 229910052762 osmium Inorganic materials 0.000 claims description 2
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims 1
- 229910052735 hafnium Inorganic materials 0.000 claims 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims 1
- 229910052707 ruthenium Inorganic materials 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 abstract description 31
- 239000002184 metal Substances 0.000 abstract description 31
- 229910000531 Co alloy Inorganic materials 0.000 abstract description 10
- 238000005260 corrosion Methods 0.000 abstract description 7
- 238000000034 method Methods 0.000 abstract description 7
- 238000004544 sputter deposition Methods 0.000 abstract description 6
- 238000007747 plating Methods 0.000 abstract description 5
- 229910000838 Al alloy Inorganic materials 0.000 abstract description 4
- 229910001096 P alloy Inorganic materials 0.000 abstract description 3
- 238000005299 abrasion Methods 0.000 abstract description 2
- 229910001260 Pt alloy Inorganic materials 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 229910000640 Fe alloy Inorganic materials 0.000 abstract 1
- 229910000990 Ni alloy Inorganic materials 0.000 abstract 1
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 230000004907 flux Effects 0.000 description 11
- 230000007797 corrosion Effects 0.000 description 6
- 238000012360 testing method Methods 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- -1 Rudenium Chemical compound 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000006249 magnetic particle Substances 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 125000006297 carbonyl amino group Chemical group [H]N([*:2])C([*:1])=O 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- OOYGSFOGFJDDHP-KMCOLRRFSA-N kanamycin A sulfate Chemical group OS(O)(=O)=O.O[C@@H]1[C@@H](O)[C@H](O)[C@@H](CN)O[C@@H]1O[C@H]1[C@H](O)[C@@H](O[C@@H]2[C@@H]([C@@H](N)[C@H](O)[C@@H](CO)O2)O)[C@H](N)C[C@@H]1N OOYGSFOGFJDDHP-KMCOLRRFSA-N 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/72—Protective coatings, e.g. anti-static or antifriction
- G11B5/722—Protective coatings, e.g. anti-static or antifriction containing an anticorrosive material
Landscapes
- Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57171694A JPS5961106A (ja) | 1982-09-30 | 1982-09-30 | 磁気記憶体 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57171694A JPS5961106A (ja) | 1982-09-30 | 1982-09-30 | 磁気記憶体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5961106A true JPS5961106A (ja) | 1984-04-07 |
| JPH0572727B2 JPH0572727B2 (enrdf_load_stackoverflow) | 1993-10-12 |
Family
ID=15927952
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57171694A Granted JPS5961106A (ja) | 1982-09-30 | 1982-09-30 | 磁気記憶体 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5961106A (enrdf_load_stackoverflow) |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61126627A (ja) * | 1984-11-26 | 1986-06-14 | Hitachi Ltd | 磁気記録媒体 |
| JPS61210518A (ja) * | 1985-03-13 | 1986-09-18 | Matsushita Electric Ind Co Ltd | 磁気記録媒体の製造方法 |
| JPS6266417A (ja) * | 1985-09-19 | 1987-03-25 | Nec Corp | 磁気記録媒体 |
| JPS62236116A (ja) * | 1986-04-08 | 1987-10-16 | Denki Kagaku Kogyo Kk | 磁気記録媒体 |
| JPS62239420A (ja) * | 1986-04-11 | 1987-10-20 | Fuji Electric Co Ltd | 磁気記録媒体 |
| JPS62250508A (ja) * | 1986-04-23 | 1987-10-31 | Hitachi Ltd | 磁気記録媒体 |
| JPS634419A (ja) * | 1986-06-24 | 1988-01-09 | Konica Corp | 炭素含有組成の保護層を設けた磁気記録媒体 |
| US4749459A (en) * | 1986-03-10 | 1988-06-07 | Komag, Inc. | Method for manufacturing a thin film magnetic recording medium |
| US4988578A (en) * | 1986-03-10 | 1991-01-29 | Komag, Inc. | Method for manufacturing a thin film magnetic recording medium |
| JPH0383224A (ja) * | 1989-08-25 | 1991-04-09 | Nec Corp | 磁気ディスク |
| US5030494A (en) * | 1989-01-26 | 1991-07-09 | International Business Machines Corporation | Carbon overcoat for a thin film magnetic recording disk containing discrete clusters of tungsten (W) or tungsten carbide (WC) which project from the surface of the overcoat |
| US5180640A (en) * | 1990-10-01 | 1993-01-19 | Komag, Inc. | Magnetic recording medium comprising a magnetic alloy layer of cobalt nickel, platinum and chromium formed directly on a nickel alloy amorphous underlayer |
| JPH07134821A (ja) * | 1984-11-26 | 1995-05-23 | Hitachi Ltd | 磁気記録媒体 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50140899A (enrdf_load_stackoverflow) * | 1974-05-01 | 1975-11-12 | ||
| JPS5127824A (ja) * | 1974-08-31 | 1976-03-09 | Sony Corp | Piiteiiienuaiishiioo gokin no seizohoho |
| JPS5174605A (ja) * | 1974-12-24 | 1976-06-28 | Suwa Seikosha Kk | Jikikirokutai |
| JPS57158036A (en) * | 1981-03-24 | 1982-09-29 | Nec Corp | Magnetic storage body |
-
1982
- 1982-09-30 JP JP57171694A patent/JPS5961106A/ja active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50140899A (enrdf_load_stackoverflow) * | 1974-05-01 | 1975-11-12 | ||
| JPS5127824A (ja) * | 1974-08-31 | 1976-03-09 | Sony Corp | Piiteiiienuaiishiioo gokin no seizohoho |
| JPS5174605A (ja) * | 1974-12-24 | 1976-06-28 | Suwa Seikosha Kk | Jikikirokutai |
| JPS57158036A (en) * | 1981-03-24 | 1982-09-29 | Nec Corp | Magnetic storage body |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07134821A (ja) * | 1984-11-26 | 1995-05-23 | Hitachi Ltd | 磁気記録媒体 |
| JPS61126627A (ja) * | 1984-11-26 | 1986-06-14 | Hitachi Ltd | 磁気記録媒体 |
| JPS61210518A (ja) * | 1985-03-13 | 1986-09-18 | Matsushita Electric Ind Co Ltd | 磁気記録媒体の製造方法 |
| JPS6266417A (ja) * | 1985-09-19 | 1987-03-25 | Nec Corp | 磁気記録媒体 |
| US4749459A (en) * | 1986-03-10 | 1988-06-07 | Komag, Inc. | Method for manufacturing a thin film magnetic recording medium |
| US4988578A (en) * | 1986-03-10 | 1991-01-29 | Komag, Inc. | Method for manufacturing a thin film magnetic recording medium |
| JPS62236116A (ja) * | 1986-04-08 | 1987-10-16 | Denki Kagaku Kogyo Kk | 磁気記録媒体 |
| JPS62239420A (ja) * | 1986-04-11 | 1987-10-20 | Fuji Electric Co Ltd | 磁気記録媒体 |
| JPS62250508A (ja) * | 1986-04-23 | 1987-10-31 | Hitachi Ltd | 磁気記録媒体 |
| JPS634419A (ja) * | 1986-06-24 | 1988-01-09 | Konica Corp | 炭素含有組成の保護層を設けた磁気記録媒体 |
| US5030494A (en) * | 1989-01-26 | 1991-07-09 | International Business Machines Corporation | Carbon overcoat for a thin film magnetic recording disk containing discrete clusters of tungsten (W) or tungsten carbide (WC) which project from the surface of the overcoat |
| JPH0383224A (ja) * | 1989-08-25 | 1991-04-09 | Nec Corp | 磁気ディスク |
| US5180640A (en) * | 1990-10-01 | 1993-01-19 | Komag, Inc. | Magnetic recording medium comprising a magnetic alloy layer of cobalt nickel, platinum and chromium formed directly on a nickel alloy amorphous underlayer |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0572727B2 (enrdf_load_stackoverflow) | 1993-10-12 |
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