JPS5956741A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS5956741A
JPS5956741A JP57167138A JP16713882A JPS5956741A JP S5956741 A JPS5956741 A JP S5956741A JP 57167138 A JP57167138 A JP 57167138A JP 16713882 A JP16713882 A JP 16713882A JP S5956741 A JPS5956741 A JP S5956741A
Authority
JP
Japan
Prior art keywords
film
isolation region
type silicon
region
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57167138A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0420261B2 (enrdf_load_stackoverflow
Inventor
Hiroshi Goto
広志 後藤
Ryoji Abe
良司 阿部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57167138A priority Critical patent/JPS5956741A/ja
Publication of JPS5956741A publication Critical patent/JPS5956741A/ja
Publication of JPH0420261B2 publication Critical patent/JPH0420261B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/763—Polycrystalline semiconductor regions

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Element Separation (AREA)
  • Bipolar Transistors (AREA)
JP57167138A 1982-09-24 1982-09-24 半導体装置の製造方法 Granted JPS5956741A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57167138A JPS5956741A (ja) 1982-09-24 1982-09-24 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57167138A JPS5956741A (ja) 1982-09-24 1982-09-24 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS5956741A true JPS5956741A (ja) 1984-04-02
JPH0420261B2 JPH0420261B2 (enrdf_load_stackoverflow) 1992-04-02

Family

ID=15844126

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57167138A Granted JPS5956741A (ja) 1982-09-24 1982-09-24 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS5956741A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5426067A (en) * 1993-08-28 1995-06-20 Nec Corporation Method for manufacturing semiconductor device with reduced junction capacitance

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57204144A (en) * 1981-06-10 1982-12-14 Hitachi Ltd Insulating and isolating method for semiconductor integrated circuit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57204144A (en) * 1981-06-10 1982-12-14 Hitachi Ltd Insulating and isolating method for semiconductor integrated circuit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5426067A (en) * 1993-08-28 1995-06-20 Nec Corporation Method for manufacturing semiconductor device with reduced junction capacitance

Also Published As

Publication number Publication date
JPH0420261B2 (enrdf_load_stackoverflow) 1992-04-02

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