JPS59501642A - 塗布用組成物ならびにそれを写真要素の修復処理および／または保護処理に使用する方法 - Google Patents
塗布用組成物ならびにそれを写真要素の修復処理および／または保護処理に使用する方法Info
- Publication number
- JPS59501642A JPS59501642A JP58502881A JP50288183A JPS59501642A JP S59501642 A JPS59501642 A JP S59501642A JP 58502881 A JP58502881 A JP 58502881A JP 50288183 A JP50288183 A JP 50288183A JP S59501642 A JPS59501642 A JP S59501642A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- radiation
- photographic
- composition
- photographic element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- DMZWVCJEOLBQCZ-UHFFFAOYSA-N chloro(ethenyl)silane Chemical compound Cl[SiH2]C=C DMZWVCJEOLBQCZ-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000000645 desinfectant Substances 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- RSJLWBUYLGJOBD-UHFFFAOYSA-M diphenyliodanium;chloride Chemical compound [Cl-].C=1C=CC=CC=1[I+]C1=CC=CC=C1 RSJLWBUYLGJOBD-UHFFFAOYSA-M 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000006735 epoxidation reaction Methods 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000007765 extrusion coating Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 230000004313 glare Effects 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 150000004676 glycans Chemical class 0.000 description 1
- 229940093920 gynecological arsenic compound Drugs 0.000 description 1
- 125000001188 haloalkyl group Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 210000003127 knee Anatomy 0.000 description 1
- 238000012700 light induced cationic polymerization Methods 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000005445 natural material Substances 0.000 description 1
- 125000000466 oxiranyl group Chemical group 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- CBQRJWBLUBDHAZ-UHFFFAOYSA-N phenacyl(triphenyl)phosphanium Chemical compound C=1C=CC=CC=1C(=O)C[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 CBQRJWBLUBDHAZ-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 229920001282 polysaccharide Polymers 0.000 description 1
- 239000005017 polysaccharide Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- YPFDHNVEDLHUCE-UHFFFAOYSA-N propane-1,3-diol Chemical compound OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 239000012748 slip agent Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
- 238000007655 standard test method Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- DBUFXGVMAMMWSD-UHFFFAOYSA-N trimethoxy-[3-(7-oxabicyclo[4.1.0]heptan-4-yl)propyl]silane Chemical compound C1C(CCC[Si](OC)(OC)OC)CCC2OC21 DBUFXGVMAMMWSD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C11/00—Auxiliary processes in photography
- G03C11/08—Varnishing, e.g. application of protective layers on finished photographic prints
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/139—Defect coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/162—Protective or antiabrasion layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Paints Or Removers (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Epoxy Resins (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/421,694 US4426431A (en) | 1982-09-22 | 1982-09-22 | Radiation-curable compositions for restorative and/or protective treatment of photographic elements |
| US421694 | 1982-09-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59501642A true JPS59501642A (ja) | 1984-09-13 |
| JPH0449933B2 JPH0449933B2 (enExample) | 1992-08-12 |
Family
ID=23671640
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58502881A Granted JPS59501642A (ja) | 1982-09-22 | 1983-08-09 | 塗布用組成物ならびにそれを写真要素の修復処理および／または保護処理に使用する方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4426431A (enExample) |
| EP (1) | EP0119219B1 (enExample) |
| JP (1) | JPS59501642A (enExample) |
| DE (1) | DE3364713D1 (enExample) |
| WO (1) | WO1984001228A1 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62229133A (ja) * | 1985-12-11 | 1987-10-07 | Konika Corp | 写真要素 |
| JPH02179638A (ja) * | 1988-12-29 | 1990-07-12 | Konica Corp | 写真要素及びその製造方法 |
Families Citing this family (74)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4564557A (en) * | 1984-04-14 | 1986-01-14 | Chisso Corporation | Thermoset acrylic resin composition for coating metallic materials and stainless steel coated with the composition |
| US4623676A (en) | 1985-01-18 | 1986-11-18 | Minnesota Mining And Manufacturing Company | Protective coating for phototools |
| GB8515475D0 (en) * | 1985-06-19 | 1985-07-24 | Ciba Geigy Ag | Forming images |
| US5194365A (en) * | 1985-06-19 | 1993-03-16 | Ciba-Geigy Corporation | Method for forming images |
| CA1312040C (en) * | 1985-12-19 | 1992-12-29 | Joseph Victor Koleske | Conformal coatings cured with actinic radiation |
| US4789620A (en) * | 1986-03-03 | 1988-12-06 | Mitsubishi Rayon Co. Ltd. | Liquid photosensitive resin composition containing carboxylated epoxy acrylates or methacrylates |
| GB8715435D0 (en) * | 1987-07-01 | 1987-08-05 | Ciba Geigy Ag | Forming images |
| US5084344A (en) * | 1988-02-26 | 1992-01-28 | Mitsubishi Paper Mills Limited | Photographic support comprising a layer containing an electron beam hardened resin and white pigment of a thickness of 5-100 microns |
| US5178996A (en) * | 1988-12-29 | 1993-01-12 | Konica Corporation | Method of making photographic element having epoxy overlayer |
| EP0431564B1 (en) * | 1989-12-05 | 1996-04-10 | Konica Corporation | Photographic-image-bearing recording member. |
| EP0487086B2 (en) * | 1990-11-22 | 2008-08-13 | Canon Kabushiki Kaisha | Method of preparing volume type phase hologram member using a photosensitive recording medium |
| US5582949A (en) * | 1990-12-27 | 1996-12-10 | Xerox Corporation | Process for improving belts |
| US5190608A (en) * | 1990-12-27 | 1993-03-02 | Xerox Corporation | Laminated belt |
| US5549999A (en) * | 1990-12-27 | 1996-08-27 | Xerox Corporation | Process for coating belt seams |
| JP2873126B2 (ja) * | 1991-04-17 | 1999-03-24 | 日本ペイント株式会社 | 体積ホログラム記録用感光性組成物 |
| US5229251A (en) * | 1991-04-29 | 1993-07-20 | International Business Machines Corp. | Dry developable photoresist containing an epoxide, organosilicon and onium salt |
| DE9116368U1 (de) * | 1991-06-15 | 1992-08-20 | Koenig & Bauer AG, 8700 Würzburg | Einrichtung zum Befestigen von Drucktüchern auf Übertragungs- oder Offsetzylindern |
| US5232812A (en) * | 1992-09-18 | 1993-08-03 | Xerox Corporation | Method of forming images using curable liquid |
| DE4234072A1 (de) * | 1992-10-09 | 1994-04-14 | Morton Int Inc | Durch Strahlung polymerisierbares Gemisch und Verfahren zur Herstellung einer Lötstoppmaske |
| DE69433206T2 (de) * | 1993-06-16 | 2004-06-24 | Minnesota Mining And Mfg. Co., St. Paul | Schwingungsdäampfende konstruktionen, die thermisch polymerisierte epoxide verwenden |
| DE4344125A1 (de) * | 1993-12-23 | 1995-06-29 | Basf Lacke & Farben | Strahlenhärtbare Schutzlackierung, insbesondere für metallisierte Oberflächen |
| US5654090A (en) * | 1994-04-08 | 1997-08-05 | Nippon Arc Co., Ltd. | Coating composition capable of yielding a cured product having a high refractive index and coated articles obtained therefrom |
| EP0853774B1 (en) * | 1995-10-06 | 2001-11-07 | Polaroid Corporation | Holographic medium and process |
| US6001893A (en) * | 1996-05-17 | 1999-12-14 | Datacard Corporation | Curable topcoat composition and methods for use |
| US6100313A (en) * | 1997-03-07 | 2000-08-08 | The Walman Optical Company | UV-curable abrasion-resistant coating composition |
| US5907000A (en) * | 1997-03-07 | 1999-05-25 | The Walman Optical Company | Adjustable refractive index coating composition |
| US5789082A (en) * | 1997-03-12 | 1998-08-04 | The Walman Optical Company | Thermosetting coating composition |
| US5907333A (en) * | 1997-03-28 | 1999-05-25 | Lexmark International, Inc. | Ink jet print head containing a radiation curable resin layer |
| US5853926A (en) * | 1997-07-23 | 1998-12-29 | Eastman Kodak Company | Pre-coated, fused plastic particles as a protective overcoat for color photographic prints |
| US5856051A (en) * | 1997-07-23 | 1999-01-05 | Eastman Kodak Company | Water-resistant protective overcoat for AgX photographic system |
| US5965304A (en) * | 1997-11-06 | 1999-10-12 | Eastman Kodak Company | Protecting layer for gelatin based AGX photographic products |
| US5952130A (en) * | 1998-08-19 | 1999-09-14 | Eastman Kodak Company | Protective layer for gelatin based AGX photographic products |
| US6232049B1 (en) | 1999-01-22 | 2001-05-15 | Eastman Kodak Company | Protective overcoat for photographic elements |
| US6077648A (en) * | 1999-01-22 | 2000-06-20 | Eastman Kodak Company | Protective overcoat for photographic elements |
| US6083676A (en) * | 1999-04-26 | 2000-07-04 | Eastman Kodak Company | Method for applying a protective overcoat to a photographic element using a fuser belt |
| EP1048466A3 (en) | 1999-04-28 | 2001-04-04 | Eastman Kodak Company | Ink jet printer having a print head for applying a protective overcoat |
| US6465165B2 (en) | 1999-05-14 | 2002-10-15 | Eastman Kodak Company | Scratch resistant-water resistant overcoat for photographic systems |
| US6303184B1 (en) | 1999-05-14 | 2001-10-16 | Eastman Kodak Company | Method of forming a discontinuous polymer overcoat for imaging elements |
| US6197482B1 (en) | 1999-05-14 | 2001-03-06 | Eastman Kodak Company | Polymer overcoat for imaging elements |
| US6426167B2 (en) | 1999-07-15 | 2002-07-30 | Eastman Kodak Company | Water-resistant protective overcoat for image recording materials |
| US6130014A (en) * | 1999-07-15 | 2000-10-10 | Eastman Kodak Company | Overcoat material as protecting layer for image recording materials |
| US6165653A (en) * | 1999-07-15 | 2000-12-26 | Eastman Kodak Company | Protecting layer for gelatin based photographic products containing 1H-pyrazolo[1,5,-b][1,2,4]triazole-type magenta coupler |
| US6221546B1 (en) | 1999-07-15 | 2001-04-24 | Eastman Kodak Company | Protecting layer for image recording materials |
| US6250760B1 (en) | 1999-08-20 | 2001-06-26 | The Walman Optical Company | Silane-based coating composition |
| US6780232B2 (en) * | 1999-08-20 | 2004-08-24 | The Walman Optical Company | Coating composition yielding abrasion-resistant tiniable coating |
| US6171770B1 (en) | 1999-11-24 | 2001-01-09 | Jiann Chen | Method for applying a protective overcoat to a photographic element |
| US6258517B1 (en) | 2000-06-06 | 2001-07-10 | Eastman Kodak Company | Imaged element with improved wet abrasion resistance |
| US6274298B1 (en) | 2000-06-07 | 2001-08-14 | Eastman Kodak Company | Protective overcoat comprising polyester ionomers for photographic elements |
| US6187517B1 (en) | 2000-06-09 | 2001-02-13 | Eastman Kodak Company | Enzyme-activated water-resistant protective overcoat for a photographic element |
| EP1303568B1 (en) * | 2000-07-19 | 2007-05-30 | Koninklijke Philips Electronics N.V. | Method of manufacturing a replica as well as a replica obtained by carrying out a uv light-initiated cationic polymerization |
| US6352805B1 (en) * | 2000-09-25 | 2002-03-05 | Eastman Kodak Company | Photocrosslinkable latex protective overcoat for imaging elements |
| US6395459B1 (en) | 2000-09-29 | 2002-05-28 | Eastman Kodak Company | Method of forming a protective overcoat for imaged elements and related articles |
| US6811937B2 (en) | 2001-06-21 | 2004-11-02 | Dsm Desotech, Inc. | Radiation-curable resin composition and rapid prototyping process using the same |
| US6573011B1 (en) | 2001-12-21 | 2003-06-03 | Eastman Kodak Company | Label with curl and moisture resistant protective layer |
| US6723402B2 (en) | 2001-12-21 | 2004-04-20 | Eastman Kodak Company | Protective layer for hydrophilic packaging material |
| US6551766B1 (en) | 2002-03-27 | 2003-04-22 | Eastman Kodak Company | Process for scratch healing of motion picture films |
| KR100796869B1 (ko) * | 2004-01-27 | 2008-01-22 | 아사히 가세이 케미칼즈 가부시키가이샤 | 레이저 조각 가능한 인쇄 기재용 감광성 수지 조성물 |
| JP4951337B2 (ja) * | 2004-03-09 | 2012-06-13 | 三菱レイヨン株式会社 | 活性エネルギー線硬化性コーティング用組成物および保護被膜形成方法 |
| US7166406B2 (en) * | 2004-05-05 | 2007-01-23 | Xerox Corporation | Prevention or reduction of thermal cracking on toner-based prints |
| US20050250039A1 (en) * | 2004-05-05 | 2005-11-10 | Xerox Corporation | Overprint compositions for xerographic prinits |
| CN101048464B (zh) * | 2004-10-25 | 2011-04-20 | 陶氏康宁公司 | 含有醇官能的有机硅树脂或者酸酐官能的有机硅树脂的涂料组合物 |
| US7423073B2 (en) * | 2004-11-23 | 2008-09-09 | Lexmark International, Inc. | Radiation curable compositions having improved flexibility |
| US7571979B2 (en) * | 2005-09-30 | 2009-08-11 | Lexmark International, Inc. | Thick film layers and methods relating thereto |
| US20070248890A1 (en) * | 2006-04-20 | 2007-10-25 | Inphase Technologies, Inc. | Index Contrasting-Photoactive Polymerizable Materials, and Articles and Methods Using Same |
| WO2009114572A2 (en) * | 2008-03-11 | 2009-09-17 | 3M Innovative Properties Company | Phototools having a protective layer |
| JP2009271259A (ja) * | 2008-05-02 | 2009-11-19 | Fujifilm Corp | レジストパターン用表面処理剤および該表面処理剤を用いたレジストパターン形成方法 |
| US20110311807A1 (en) * | 2008-06-20 | 2011-12-22 | Akzo Nobel Coatings International B.V. | Flexible substrates having reduced shrinkage and curling |
| CN104387772B (zh) | 2009-05-01 | 2017-07-11 | 纳米系统公司 | 用于纳米结构体分散的官能化基质 |
| JP5583210B2 (ja) | 2009-07-21 | 2014-09-03 | スリーエム イノベイティブ プロパティズ カンパニー | 硬化性組成物、フォトツールをコーティングする方法、及びコーティングされたフォトツール |
| US8420281B2 (en) * | 2009-09-16 | 2013-04-16 | 3M Innovative Properties Company | Epoxy-functionalized perfluoropolyether polyurethanes |
| WO2011034845A1 (en) | 2009-09-16 | 2011-03-24 | 3M Innovative Properties Company | Fluorinated coating and phototools made therewith |
| EP2478033A1 (en) | 2009-09-16 | 2012-07-25 | 3M Innovative Properties Company | Fluorinated coating and phototools made therewith |
| WO2013171579A1 (en) * | 2012-05-16 | 2013-11-21 | Universite De Haute-Alsace | Radiation radically and cationically curable composition, and method for preparing a hybrid sol-gel layer on a surface of a substrate using said composition |
| GB201223064D0 (en) * | 2012-12-20 | 2013-02-06 | Rainbow Technology Systems Ltd | Curable coatings for photoimaging |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54127319A (en) * | 1978-03-13 | 1979-10-03 | Minnesota Mining & Mfg | Transparent film having video |
| JPS5691233A (en) * | 1979-12-01 | 1981-07-24 | Agfa Gevaert Ag | Preparing protective layer for photography material |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3753755A (en) | 1971-04-26 | 1973-08-21 | Minnesota Mining & Mfg | Sheet material coated with heat hardenable tacky adhesive |
| US4025407A (en) | 1971-05-05 | 1977-05-24 | Ppg Industries, Inc. | Method for preparing high solids films employing a plurality of curing mechanisms |
| US4025348A (en) | 1974-05-10 | 1977-05-24 | Hitachi Chemical Company, Ltd. | Photosensitive resin compositions |
| US4049861A (en) * | 1975-03-07 | 1977-09-20 | Minnesota Mining And Manufacturing Company | Abrasion resistant coatings |
| US4256828A (en) | 1975-09-02 | 1981-03-17 | Minnesota Mining And Manufacturing Company | Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials |
| US4171979A (en) | 1976-11-01 | 1979-10-23 | Eastman Kodak Company | Method of treating scratched or abraded photographic elements with radiation-curable compositions comprising an acrylated urethane, an aliphatic ethylenically-unsaturated carboxylic acid and a multifunctional acrylate |
| US4092173A (en) | 1976-11-01 | 1978-05-30 | Eastman Kodak Company | Photographic elements coated with protective overcoats |
| US4101513A (en) | 1977-02-02 | 1978-07-18 | Minnesota Mining And Manufacturing Company | Catalyst for condensation of hydrolyzable silanes and storage stable compositions thereof |
| US4156046A (en) | 1977-03-28 | 1979-05-22 | Minnesota Mining And Manufacturing Company | Ultraviolet radiation protective, abrasion resistant, bloom resistant coatings |
| US4156035A (en) | 1978-05-09 | 1979-05-22 | W. R. Grace & Co. | Photocurable epoxy-acrylate compositions |
| US4348462A (en) * | 1980-07-11 | 1982-09-07 | General Electric Company | Abrasion resistant ultraviolet light curable hard coating compositions |
| CA1172790A (en) | 1980-11-24 | 1984-08-14 | Gerald M. Leszyk | Radiation curable composition including an acrylated urethane, and unsaturated carboxylic acid, a multifunctional acrylate and a siloxy-containing polycarbinol |
-
1982
- 1982-09-22 US US06/421,694 patent/US4426431A/en not_active Expired - Lifetime
-
1983
- 1983-08-09 JP JP58502881A patent/JPS59501642A/ja active Granted
- 1983-08-09 DE DE8383902778T patent/DE3364713D1/de not_active Expired
- 1983-08-09 EP EP83902778A patent/EP0119219B1/en not_active Expired
- 1983-08-09 WO PCT/US1983/001214 patent/WO1984001228A1/en not_active Ceased
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54127319A (en) * | 1978-03-13 | 1979-10-03 | Minnesota Mining & Mfg | Transparent film having video |
| JPS5691233A (en) * | 1979-12-01 | 1981-07-24 | Agfa Gevaert Ag | Preparing protective layer for photography material |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62229133A (ja) * | 1985-12-11 | 1987-10-07 | Konika Corp | 写真要素 |
| JPH02179638A (ja) * | 1988-12-29 | 1990-07-12 | Konica Corp | 写真要素及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO1984001228A1 (en) | 1984-03-29 |
| EP0119219A1 (en) | 1984-09-26 |
| DE3364713D1 (en) | 1986-08-28 |
| EP0119219B1 (en) | 1986-07-23 |
| JPH0449933B2 (enExample) | 1992-08-12 |
| US4426431A (en) | 1984-01-17 |
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