JPS5947822A - 弾性表面波用基板の製造方法 - Google Patents

弾性表面波用基板の製造方法

Info

Publication number
JPS5947822A
JPS5947822A JP15678982A JP15678982A JPS5947822A JP S5947822 A JPS5947822 A JP S5947822A JP 15678982 A JP15678982 A JP 15678982A JP 15678982 A JP15678982 A JP 15678982A JP S5947822 A JPS5947822 A JP S5947822A
Authority
JP
Japan
Prior art keywords
substrate
mirror
sides
single crystal
acoustic wave
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15678982A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0218612B2 (enExample
Inventor
Takeshi Yokoyama
武 横山
Akikazu Tanaka
明和 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP15678982A priority Critical patent/JPS5947822A/ja
Publication of JPS5947822A publication Critical patent/JPS5947822A/ja
Publication of JPH0218612B2 publication Critical patent/JPH0218612B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
JP15678982A 1982-09-10 1982-09-10 弾性表面波用基板の製造方法 Granted JPS5947822A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15678982A JPS5947822A (ja) 1982-09-10 1982-09-10 弾性表面波用基板の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15678982A JPS5947822A (ja) 1982-09-10 1982-09-10 弾性表面波用基板の製造方法

Publications (2)

Publication Number Publication Date
JPS5947822A true JPS5947822A (ja) 1984-03-17
JPH0218612B2 JPH0218612B2 (enExample) 1990-04-26

Family

ID=15635336

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15678982A Granted JPS5947822A (ja) 1982-09-10 1982-09-10 弾性表面波用基板の製造方法

Country Status (1)

Country Link
JP (1) JPS5947822A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6465096A (en) * 1987-09-04 1989-03-10 Toshiba Corp Production of substrate comprising single crystal of lithium tetraborate
JPH0616557U (ja) * 1992-07-23 1994-03-04 ミサワホーム株式会社 太陽電池付き屋根パネル
JP2001332949A (ja) * 2000-05-19 2001-11-30 Toshiba Corp 弾性表面波素子の製造方法
JP2003017983A (ja) * 2001-06-28 2003-01-17 Kyocera Corp 弾性波装置用ウエハ及びそれを用いた弾性波装置
US6884972B2 (en) 1999-12-09 2005-04-26 Ibiden Co., Ltd. Ceramic plate for a semiconductor producing/inspecting apparatus
JP2021034629A (ja) * 2019-08-28 2021-03-01 住友金属鉱山株式会社 圧電性基板、圧電性基板の製造方法、及び複合基板

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6465096A (en) * 1987-09-04 1989-03-10 Toshiba Corp Production of substrate comprising single crystal of lithium tetraborate
JPH0616557U (ja) * 1992-07-23 1994-03-04 ミサワホーム株式会社 太陽電池付き屋根パネル
US6884972B2 (en) 1999-12-09 2005-04-26 Ibiden Co., Ltd. Ceramic plate for a semiconductor producing/inspecting apparatus
JP2001332949A (ja) * 2000-05-19 2001-11-30 Toshiba Corp 弾性表面波素子の製造方法
JP2003017983A (ja) * 2001-06-28 2003-01-17 Kyocera Corp 弾性波装置用ウエハ及びそれを用いた弾性波装置
JP2021034629A (ja) * 2019-08-28 2021-03-01 住友金属鉱山株式会社 圧電性基板、圧電性基板の製造方法、及び複合基板

Also Published As

Publication number Publication date
JPH0218612B2 (enExample) 1990-04-26

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