JPS5939713A - シリコン薄膜及びその製造方法 - Google Patents

シリコン薄膜及びその製造方法

Info

Publication number
JPS5939713A
JPS5939713A JP14939982A JP14939982A JPS5939713A JP S5939713 A JPS5939713 A JP S5939713A JP 14939982 A JP14939982 A JP 14939982A JP 14939982 A JP14939982 A JP 14939982A JP S5939713 A JPS5939713 A JP S5939713A
Authority
JP
Japan
Prior art keywords
substrate
thin film
silicon
grid
silicon thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14939982A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6367555B2 (enExample
Inventor
Kazunobu Tanaka
田中　一宜
Akihisa Matsuda
彰久 松田
Keiji Kumagai
熊谷　啓二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tonen General Sekiyu KK
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Toa Nenryo Kogyyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Toa Nenryo Kogyyo KK filed Critical Agency of Industrial Science and Technology
Priority to JP14939982A priority Critical patent/JPS5939713A/ja
Publication of JPS5939713A publication Critical patent/JPS5939713A/ja
Publication of JPS6367555B2 publication Critical patent/JPS6367555B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
  • Silicon Compounds (AREA)
JP14939982A 1982-08-29 1982-08-29 シリコン薄膜及びその製造方法 Granted JPS5939713A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14939982A JPS5939713A (ja) 1982-08-29 1982-08-29 シリコン薄膜及びその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14939982A JPS5939713A (ja) 1982-08-29 1982-08-29 シリコン薄膜及びその製造方法

Publications (2)

Publication Number Publication Date
JPS5939713A true JPS5939713A (ja) 1984-03-05
JPS6367555B2 JPS6367555B2 (enExample) 1988-12-26

Family

ID=15474277

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14939982A Granted JPS5939713A (ja) 1982-08-29 1982-08-29 シリコン薄膜及びその製造方法

Country Status (1)

Country Link
JP (1) JPS5939713A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62111435A (ja) * 1985-07-15 1987-05-22 Hitachi Ltd 低温プラズマによる成膜方法及び装置
JPS6336522A (ja) * 1986-07-30 1988-02-17 Yoshihiro Hamakawa 非晶質薄膜の形成方法
JP2009155112A (ja) * 2007-12-25 2009-07-16 Panasonic Electric Works Co Ltd 多結晶薄膜の製造方法、複合ナノ結晶層の製造方法、電界放射型電子源、発光デバイス

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5698820A (en) * 1980-01-09 1981-08-08 Nec Corp Preparation of amorphous semiconductor film
JPS5767020A (en) * 1980-10-15 1982-04-23 Agency Of Ind Science & Technol Thin silicon film and its manufacture

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5698820A (en) * 1980-01-09 1981-08-08 Nec Corp Preparation of amorphous semiconductor film
JPS5767020A (en) * 1980-10-15 1982-04-23 Agency Of Ind Science & Technol Thin silicon film and its manufacture

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62111435A (ja) * 1985-07-15 1987-05-22 Hitachi Ltd 低温プラズマによる成膜方法及び装置
JPS6336522A (ja) * 1986-07-30 1988-02-17 Yoshihiro Hamakawa 非晶質薄膜の形成方法
JP2009155112A (ja) * 2007-12-25 2009-07-16 Panasonic Electric Works Co Ltd 多結晶薄膜の製造方法、複合ナノ結晶層の製造方法、電界放射型電子源、発光デバイス

Also Published As

Publication number Publication date
JPS6367555B2 (enExample) 1988-12-26

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