JPS5924132U - Microwave plasma processing equipment - Google Patents
Microwave plasma processing equipmentInfo
- Publication number
- JPS5924132U JPS5924132U JP12072982U JP12072982U JPS5924132U JP S5924132 U JPS5924132 U JP S5924132U JP 12072982 U JP12072982 U JP 12072982U JP 12072982 U JP12072982 U JP 12072982U JP S5924132 U JPS5924132 U JP S5924132U
- Authority
- JP
- Japan
- Prior art keywords
- plasma generation
- plasma processing
- microwave
- plasma
- microwave plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は従来のマイクロ波プラズマ処理装置を示す断面
図、第2図はこの考案の一実施例に係るマイクロ波プラ
ズマ処理装置の要部を示す断面図である。
1・・・マイクロ波発振器(マイクロ波発振源)、−2
・・・アイソレータ、3・・・パワーモニタ、3a・・
・指示計、4・・・整合器、5・・・プラズマ発生炉、
5a・・・遮蔽筒、6・・・摺動短絡板、7・・・反応
器、7a・・・ガス輸送管、7b・・・排気管、7C・
・・プラズマ発生管、8・・・排気装置、9・・・パツ
キン、10・・・蓋、11・・・被処理物、12・・・
流量調節弁、13・・・真空計、14・・・高周波放電
筒(高周波発生器)。FIG. 1 is a sectional view showing a conventional microwave plasma processing apparatus, and FIG. 2 is a sectional view showing essential parts of a microwave plasma processing apparatus according to an embodiment of the invention. 1...Microwave oscillator (microwave oscillation source), -2
...Isolator, 3...Power monitor, 3a...
・Indicator, 4... Matching box, 5... Plasma generation furnace,
5a... Shield tube, 6... Sliding short circuit plate, 7... Reactor, 7a... Gas transport pipe, 7b... Exhaust pipe, 7C.
... Plasma generation tube, 8... Exhaust device, 9... Packing, 10... Lid, 11... Processing object, 12...
Flow rate control valve, 13... Vacuum gauge, 14... High frequency discharge tube (high frequency generator).
Claims (2)
力部に連設されたプラズマ発生炉と、このプラズマ発生
炉に貫通装着されているプラズマ発生管と、このプラズ
マ発生管にて発生した活性化ガスを導き被処理物に活性
化ガスを照射する反応器を備えたマイクロ波プラズマ処
理装置において、 上記プラズマ発生管の近傍に高周波発生器を設けたこと
を特徴とするマイクロ波プラズマ処理装置。(1) A microwave oscillation source, a plasma generation furnace connected to the output part of the microwave oscillation source, a plasma generation tube installed through the plasma generation furnace, and a plasma generation tube installed in the plasma generation tube. A microwave plasma processing apparatus equipped with a reactor that introduces an activated gas and irradiates the object to be treated with the activated gas, characterized in that a high frequency generator is provided near the plasma generation tube. .
して上記高周波発生器の影響を与えるよう配置したこと
を特徴とする実用新案登録請求の範囲第1項記載のマイ
クロ波プラズマ処理装置。(2) The microwave plasma processing apparatus according to claim 1, wherein a plurality of the plasma generating tubes are arranged so as to be collectively influenced by the high frequency generator.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12072982U JPS5924132U (en) | 1982-08-09 | 1982-08-09 | Microwave plasma processing equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12072982U JPS5924132U (en) | 1982-08-09 | 1982-08-09 | Microwave plasma processing equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5924132U true JPS5924132U (en) | 1984-02-15 |
JPS6236240Y2 JPS6236240Y2 (en) | 1987-09-14 |
Family
ID=30276581
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12072982U Granted JPS5924132U (en) | 1982-08-09 | 1982-08-09 | Microwave plasma processing equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5924132U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59226027A (en) * | 1983-06-07 | 1984-12-19 | Toyota Motor Corp | Plasma treatment |
JPH02151021A (en) * | 1988-12-02 | 1990-06-11 | Agency Of Ind Science & Technol | Plasma processing and deposition apparatus |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5221332U (en) * | 1975-08-01 | 1977-02-15 |
-
1982
- 1982-08-09 JP JP12072982U patent/JPS5924132U/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5221332U (en) * | 1975-08-01 | 1977-02-15 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59226027A (en) * | 1983-06-07 | 1984-12-19 | Toyota Motor Corp | Plasma treatment |
JPH02151021A (en) * | 1988-12-02 | 1990-06-11 | Agency Of Ind Science & Technol | Plasma processing and deposition apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS6236240Y2 (en) | 1987-09-14 |
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