JPS6231900U - - Google Patents
Info
- Publication number
- JPS6231900U JPS6231900U JP12158585U JP12158585U JPS6231900U JP S6231900 U JPS6231900 U JP S6231900U JP 12158585 U JP12158585 U JP 12158585U JP 12158585 U JP12158585 U JP 12158585U JP S6231900 U JPS6231900 U JP S6231900U
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- microwave
- plasma processing
- plasma generation
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000010355 oscillation Effects 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- Drying Of Semiconductors (AREA)
Description
第１図はこの考案の一実施例に係るマイクロ波
プラズマ処理装置の要部を示す断面図、第２図は
従来のマイクロ波プラズマ処理装置を示す断面図
である。
１……マイクロ波発振器（マイクロ波発振源）
、２……アイソレータ、３……パワーモニタ、３
ａ……指示計、４……整合器、５……プラズマ発
生炉、５ａ……シールド筒、６……摺動短絡板、
７……反応器、７ａ……ガス輸送管、７ｂ……排
気管、７ｃ……プラズマ発生管、８……排気装置
、９……パツキング、１０……蓋、１１……被処
理物、１２……流量調節弁、１３……真空計、１
４……照度検出器。
FIG. 1 is a sectional view showing essential parts of a microwave plasma processing apparatus according to an embodiment of the invention, and FIG. 2 is a sectional view showing a conventional microwave plasma processing apparatus. 1...Microwave oscillator (microwave oscillation source)
, 2...Isolator, 3...Power monitor, 3
a... Indicator, 4... Matching box, 5... Plasma generation furnace, 5a... Shield cylinder, 6... Sliding short circuit plate,
7... Reactor, 7a... Gas transport pipe, 7b... Exhaust pipe, 7c... Plasma generation tube, 8... Exhaust device, 9... Packing, 10... Lid, 11... Processing object, 12 ...Flow control valve, 13 ...Vacuum gauge, 1
4...Illuminance detector.
Claims (1)
れたマイクロ波プラズマ発生炉と、このマイクロ
波プラズマ発生炉を貫通して設けられた誘電体製
プラズマ発生管と、このプラズマ発生管に接続さ
れたプラズマ処理室と、プラズマ発生管へ処理ガ
スを供給する処理ガス供給源と、プラズマ処理室
の排気および処理ガスを処理ガス供給源からプラ
ズマ発生管、プラズマ処理室へ輸送するための排
気装置からなるマイクロ波プラズマ処理室におい
て、プラズマ処理室に照度検出器を設けたことを
特徴とするマイクロ波プラズマ処理装置。 (2) 前記照度検出器より得た情報により、プラ
ズマ処理結果の良・否を判定する機能を有するこ
とを特徴とする実用新案登録請求の範囲第１項記
載のマイクロ波プラズマ処理装置。[Scope of Claim for Utility Model Registration] (1) A microwave oscillator, a microwave plasma generation furnace connected to the oscillator, and a dielectric plasma generation tube provided through the microwave plasma generation furnace. , a plasma processing chamber connected to this plasma generation tube, a processing gas supply source that supplies processing gas to the plasma generation tube, and a processing gas supply source that supplies exhaust gas from the plasma processing chamber and the processing gas from the plasma generation tube to the plasma processing A microwave plasma processing apparatus, characterized in that the microwave plasma processing chamber includes an exhaust device for transporting the plasma to the chamber, and an illuminance detector is provided in the plasma processing chamber. (2) The microwave plasma processing apparatus according to claim 1, which has a function of determining whether the plasma processing result is good or bad based on the information obtained from the illuminance detector.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12158585U JPS6231900U (en) | 1985-08-09 | 1985-08-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12158585U JPS6231900U (en) | 1985-08-09 | 1985-08-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6231900U true JPS6231900U (en) | 1987-02-25 |
Family
ID=31010996
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12158585U Pending JPS6231900U (en) | 1985-08-09 | 1985-08-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6231900U (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5884431A (en) * | 1981-11-13 | 1983-05-20 | Nec Corp | Plasma etching device |
| JPS6016424A (en) * | 1983-07-08 | 1985-01-28 | Fujitsu Ltd | Microwave plasma processing method and apparatus thereof |
-
1985
- 1985-08-09 JP JP12158585U patent/JPS6231900U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5884431A (en) * | 1981-11-13 | 1983-05-20 | Nec Corp | Plasma etching device |
| JPS6016424A (en) * | 1983-07-08 | 1985-01-28 | Fujitsu Ltd | Microwave plasma processing method and apparatus thereof |
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