JPS6256137U - - Google Patents
Info
- Publication number
- JPS6256137U JPS6256137U JP14560285U JP14560285U JPS6256137U JP S6256137 U JPS6256137 U JP S6256137U JP 14560285 U JP14560285 U JP 14560285U JP 14560285 U JP14560285 U JP 14560285U JP S6256137 U JPS6256137 U JP S6256137U
- Authority
- JP
- Japan
- Prior art keywords
- plasma generation
- reflected power
- microwave
- processing apparatus
- generation tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000010355 oscillation Effects 0.000 claims description 3
- 230000032258 transport Effects 0.000 claims 3
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
Landscapes
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Drying Of Semiconductors (AREA)
Description
第１図はこの考案の一実施例に係るマイクロ波
プラズマ処理装置を示す概略構成図、第２図ａ，
ｂはこの考案で用いるメータリレーの動作説明図
、第３図は従来のマイクロ波プラズマ処理装置を
示す概略構成図である。
１……マイクロ波発振機（マイクロ波発振源）
、２……プラズマ発生炉、３……プラズマ発生管
、４……整合器、５……方向性結合器、６……ア
イソレータ、７……２接点設定式メータリレー、
２１……反射電力検出器。
Fig. 1 is a schematic configuration diagram showing a microwave plasma processing apparatus according to an embodiment of the invention, Fig. 2a,
b is an explanatory diagram of the operation of the meter relay used in this invention, and FIG. 3 is a schematic configuration diagram showing a conventional microwave plasma processing apparatus. 1...Microwave oscillator (microwave oscillation source)
, 2... Plasma generation furnace, 3... Plasma generation tube, 4... Matching device, 5... Directional coupler, 6... Isolator, 7... 2-contact setting type meter relay,
21...Reflected power detector.
Claims (1)
アイソレータ、方向性結合器、整合器を直列に介
して連設されたプラズマ発生炉と、このプラズマ
発生炉に貫通装着されているプラズマ発生管と、
このプラズマ発生管に連設されプラズマ発生管に
て発生した活性化ガスを輸送するガス輸送管と、
このガス輸送管に連設され被処理物に上記活性化
ガスを照射する処理室とを備えたマイクロ波プラ
ズマ処理装置において、 上記方向性結合器に反射電力レベルを検出する
反射電力検出器を１個接続し、更にこの反射電力
検出器に２接点設定式メータリレーを１個接続し
、反射電力の上限及び下限を監視することを特徴
とするマイクロ波プラズマ処理装置。[Claims for Utility Model Registration] A microwave oscillation source, a plasma generation furnace connected to the microwave oscillation source through an isolator, a directional coupler, and a matching device in series, and a through-mounting in the plasma generation furnace. A plasma generation tube that is
A gas transport pipe that is connected to the plasma generation tube and transports the activated gas generated in the plasma generation tube;
In a microwave plasma processing apparatus including a processing chamber connected to the gas transport pipe and for irradiating the activated gas onto the object to be processed, the directional coupler is provided with a reflected power detector for detecting a reflected power level. A microwave plasma processing apparatus characterized in that a two-contact setting type meter relay is further connected to the reflected power detector to monitor upper and lower limits of the reflected power.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14560285U JPH0323304Y2 (en) | 1985-09-24 | 1985-09-24 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14560285U JPH0323304Y2 (en) | 1985-09-24 | 1985-09-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6256137U true JPS6256137U (en) | 1987-04-07 |
| JPH0323304Y2 JPH0323304Y2 (en) | 1991-05-21 |
Family
ID=31057294
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14560285U Expired JPH0323304Y2 (en) | 1985-09-24 | 1985-09-24 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0323304Y2 (en) |
-
1985
- 1985-09-24 JP JP14560285U patent/JPH0323304Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0323304Y2 (en) | 1991-05-21 |
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