JPS61206299U - - Google Patents
Info
- Publication number
- JPS61206299U JPS61206299U JP8881685U JP8881685U JPS61206299U JP S61206299 U JPS61206299 U JP S61206299U JP 8881685 U JP8881685 U JP 8881685U JP 8881685 U JP8881685 U JP 8881685U JP S61206299 U JPS61206299 U JP S61206299U
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- plasma generation
- microwave
- processing chamber
- generation tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011888 foil Substances 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
Description
第１図はこの考案の一実施例に係るマイクロ波
プラズマ処理装置の要部を示す断面図、第２図は
従来のマイクロ波プラズマ処理装置を示す断面図
である。
１……マイクロ波発振器（マイクロ波発振源）
、２……アイソレータ、３……パワーモニタ、３
ａ……指示計、４……整合器、５……プラズマ発
生炉、５ａ……遮蔽箔、６……摺動短絡板、７…
…反応器、７ａ……ガス輸送管、７ｂ……排気管
、７ｃ……プラズマ発生管、８……排気装置、９
……パツキン、１０……蓋、１１……被処理物、
１２……流量調節弁、１３……真空計、１４……
温度検出器。
FIG. 1 is a sectional view showing essential parts of a microwave plasma processing apparatus according to an embodiment of the invention, and FIG. 2 is a sectional view showing a conventional microwave plasma processing apparatus. 1...Microwave oscillator (microwave oscillation source)
, 2...Isolator, 3...Power monitor, 3
a... Indicator, 4... Matching device, 5... Plasma generation furnace, 5a... Shielding foil, 6... Sliding short circuit plate, 7...
...Reactor, 7a... Gas transport pipe, 7b... Exhaust pipe, 7c... Plasma generation tube, 8... Exhaust device, 9
...packing, 10...lid, 11...object to be processed,
12...Flow control valve, 13...Vacuum gauge, 14...
Temperature detector.
Claims (1)
マイクロ波プラズマ発生炉と、このマイクロ波プ
ラズマ発生炉を貫通して設けられた誘電体製プラ
ズマ発生管と、このプラズマ発生管に接続された
プラズマ処理室と、プラズマ発生管へ処理ガスを
供給する処理ガス供給源と、プラズマ処理室の排
気および処理ガスを処理ガス供給源からプラズマ
発生管、プラズマ処理室へ輸送するための排気装
置を具備するマイクロ波プラズマ処理室において
、プラズマ発生管近傍あるいはプラズマ処理室に
設けられたプラズマ温度検出器と、この温度検出
器から得た情報により、プラズマ処理結果の良・
否を判定する手段とを有することを特徴とするマ
イクロ波プラズマ処理装置。 A microwave oscillator, a microwave plasma generation furnace connected to the oscillator, a dielectric plasma generation tube provided through the microwave plasma generation furnace, and a plasma connected to the plasma generation tube. It is equipped with a processing chamber, a processing gas supply source that supplies processing gas to the plasma generation tube, and an exhaust device for exhausting the plasma processing chamber and transporting the processing gas from the processing gas supply source to the plasma generation tube and the plasma processing chamber. In the microwave plasma processing chamber, a plasma temperature detector is installed near the plasma generation tube or in the plasma processing chamber, and the information obtained from this temperature detector is used to determine whether the plasma processing results are good or not.
1. A microwave plasma processing apparatus comprising: means for determining whether
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8881685U JPS61206299U (en) | 1985-06-14 | 1985-06-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8881685U JPS61206299U (en) | 1985-06-14 | 1985-06-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61206299U true JPS61206299U (en) | 1986-12-26 |
Family
ID=30642314
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8881685U Pending JPS61206299U (en) | 1985-06-14 | 1985-06-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61206299U (en) |
-
1985
- 1985-06-14 JP JP8881685U patent/JPS61206299U/ja active Pending
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