JPH02106824U - - Google Patents
Info
- Publication number
- JPH02106824U JPH02106824U JP1605389U JP1605389U JPH02106824U JP H02106824 U JPH02106824 U JP H02106824U JP 1605389 U JP1605389 U JP 1605389U JP 1605389 U JP1605389 U JP 1605389U JP H02106824 U JPH02106824 U JP H02106824U
- Authority
- JP
- Japan
- Prior art keywords
- plasma generation
- tube
- plasma
- microwave
- oscillation source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000010355 oscillation Effects 0.000 claims description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Description
第１図はこの考案の一実施例に係るマイクロ波
プラズマ処理装置を示す概略構成図、第２図はこ
の考案の変形例を示す概略構成図、第３図は従来
のマイクロ波プラズマ処理装置を示す概略構成図
である。
１……マイクロ波発振源、２……アイソレータ
、３……パワーモニタ、４……整合器、５……プ
ラズマ発生炉、６……アイソレータ、７……プラ
ズマ発生管、１１……被処理物、１３……ガス輸
送管、１４……処理室、１５……原料ガスボンベ
、１７……伸縮導波管。
FIG. 1 is a schematic configuration diagram showing a microwave plasma processing apparatus according to an embodiment of this invention, FIG. 2 is a schematic configuration diagram showing a modification of this invention, and FIG. 3 is a schematic diagram showing a conventional microwave plasma processing apparatus. FIG. DESCRIPTION OF SYMBOLS 1... Microwave oscillation source, 2... Isolator, 3... Power monitor, 4... Matching box, 5... Plasma generation furnace, 6... Isolator, 7... Plasma generation tube, 11... Processing object , 13... Gas transport pipe, 14... Processing chamber, 15... Raw material gas cylinder, 17... Expandable waveguide.
Claims (1)
アイソレータ、方向性結合器、整合器を直列に介
して連設されたプラズマ発生炉と、このプラズマ
発生炉に貫通装着されたプラズマ発生管と、この
プラズマ発生管に連設されプラズマ発生管にて発
生した活性化ガスを輸送するガス輸送管と、この
ガス輸送管に連設され被処理物に上記活性化ガス
を照射する処理室とを備えたマイクロ波プラズマ
処理装置において、 上記マイクロ波発振源と上記プラズマ発生炉と
の間に伸縮導波管が設けられ、この伸縮導波管に
より上記プラズマ発生炉と上記プラズマ発生管と
の相対位置が可変となることを特徴とするマイク
ロ波プラズマ処理装置。[Scope of Claim for Utility Model Registration] A microwave oscillation source, a plasma generation furnace in which the microwave oscillation source is connected in series with an isolator, a directional coupler, and a matching device, and a through-fitting in the plasma generation furnace. a plasma generation tube, a gas transportation tube connected to the plasma generation tube for transporting the activated gas generated in the plasma generation tube, and a gas transportation tube connected to the gas transportation tube to transport the activated gas to the object to be treated. In a microwave plasma processing apparatus equipped with a processing chamber for irradiation, a telescoping waveguide is provided between the microwave oscillation source and the plasma generation furnace, and the telescoping waveguide connects the plasma generation furnace and the plasma. A microwave plasma processing device characterized in that the relative position with respect to a generation tube is variable.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1605389U JPH02106824U (en) | 1989-02-14 | 1989-02-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1605389U JPH02106824U (en) | 1989-02-14 | 1989-02-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02106824U true JPH02106824U (en) | 1990-08-24 |
Family
ID=31228647
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1605389U Pending JPH02106824U (en) | 1989-02-14 | 1989-02-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02106824U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003052807A1 (en) * | 2001-12-14 | 2003-06-26 | Tokyo Electron Limited | Plasma processor |
-
1989
- 1989-02-14 JP JP1605389U patent/JPH02106824U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003052807A1 (en) * | 2001-12-14 | 2003-06-26 | Tokyo Electron Limited | Plasma processor |
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