JPH0267637U - - Google Patents
Info
- Publication number
- JPH0267637U JPH0267637U JP14662288U JP14662288U JPH0267637U JP H0267637 U JPH0267637 U JP H0267637U JP 14662288 U JP14662288 U JP 14662288U JP 14662288 U JP14662288 U JP 14662288U JP H0267637 U JPH0267637 U JP H0267637U
- Authority
- JP
- Japan
- Prior art keywords
- microwave
- waveguide
- tube
- sample
- treated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002184 metal Substances 0.000 claims 1
- 239000007769 metal material Substances 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Description
第１図は本考案の一実施例を示すマイクロ波プ
ラズマ処理装置の縦断面斜視図である。
１……マグネトロン、２……矩形導波管、３…
…変換導波管、４……円形導波管、５……ベルジ
ヤー、６……試料、７……試料台、８……ガス供
給ノズル、９……円筒、１０……仕切板。
FIG. 1 is a vertical cross-sectional perspective view of a microwave plasma processing apparatus showing an embodiment of the present invention. 1... Magnetron, 2... Rectangular waveguide, 3...
... Conversion waveguide, 4 ... Circular waveguide, 5 ... Belgear, 6 ... Sample, 7 ... Sample stage, 8 ... Gas supply nozzle, 9 ... Cylinder, 10 ... Partition plate.
Claims (1)
クロ波で生成されるガスプラズマで処理される試
料よりも大きな金属製の筒を設け、該筒と前記導
波管とを金属材料で締結したことを特徴とするマ
イクロ波プラズマ処理装置。 A metal tube larger than the sample to be treated with the gas plasma generated by the microwave is provided in the waveguide through which the microwave passes, and the tube and the waveguide are connected with a metal material. Features of microwave plasma processing equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14662288U JPH0617284Y2 (en) | 1988-11-11 | 1988-11-11 | Microwave plasma processing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14662288U JPH0617284Y2 (en) | 1988-11-11 | 1988-11-11 | Microwave plasma processing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0267637U true JPH0267637U (en) | 1990-05-22 |
| JPH0617284Y2 JPH0617284Y2 (en) | 1994-05-02 |
Family
ID=31416283
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14662288U Expired - Lifetime JPH0617284Y2 (en) | 1988-11-11 | 1988-11-11 | Microwave plasma processing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0617284Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH076895A (en) * | 1993-12-17 | 1995-01-10 | Hitachi Ltd | Microwave plasma processing device |
-
1988
- 1988-11-11 JP JP14662288U patent/JPH0617284Y2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH076895A (en) * | 1993-12-17 | 1995-01-10 | Hitachi Ltd | Microwave plasma processing device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0617284Y2 (en) | 1994-05-02 |