JPS61206649U

JPS61206649U -

Info

Publication number: JPS61206649U
Application number: JP8953085U
Authority: JP
Priority date: 1985-06-13
Filing date: 1985-06-13
Publication date: 1986-12-27

Description

[Brief explanation of the drawing]

第１図乃至第５図は本考案の一実施例を示し、
第１図は断面図（第２図―線断面図）、第２
図は扉を取り外した状態の正面図、第３図はドラ
ム治具の配設状態を示す扉を開いた状態の第１図
相当図、第４図はドラム治具を示し、同図イは展
開図、同図ロは組み立てた状態の正面図、第５図
は被処理物の固定治具への取付け状態を示す分解
斜視図、第６図は他の実施例を示す第１図相当図
、第７図はガス導入管の先端の変形例を示し、同
図イは使用状態の要部断面図、同図ロは底面図、
第８図はガス導入管の先端の更に他の変形例を示
し、同図イは使用状態の要部断面図、同図ロは底
面図、第９図及び第１０図は夫々異なるバツチ方
式のプラズマ処理装置の全体の概要を示す回路図
である。２……ガス導入管、３……ジエネレータ、４…
…導波管、５，５′……シヤワー管、６……プラ
ズマ処理室、８……真空排気用配管、１３……扉
、１７……被処理物、１９……ドラム治具、２１
……固定治具、２３……ヘツド部。 1 to 5 show an embodiment of the present invention,
Figure 1 is a sectional view (Figure 2 - line sectional view),
The figure is a front view with the door removed, Figure 3 is a view equivalent to Figure 1 with the door open showing the arrangement of the drum jig, Figure 4 shows the drum jig, and Figure 4 shows the drum jig. Developed view, B is a front view of the assembled state, FIG. 5 is an exploded perspective view showing how the object to be treated is attached to the fixing jig, and FIG. 6 is a view equivalent to FIG. 1 showing another embodiment. , Fig. 7 shows a modified example of the tip of the gas introduction pipe, Fig. 7A is a sectional view of the main part in use, Fig. 7B is a bottom view,
Fig. 8 shows still another modification of the tip of the gas introduction pipe, Fig. 8A is a sectional view of the main part in use, Fig. 8B is a bottom view, and Figs. 9 and 10 are of different batch systems. 1 is a circuit diagram showing an overall outline of a plasma processing apparatus. 2... Gas introduction pipe, 3... Generator, 4...
... Waveguide, 5, 5' ... Shower tube, 6 ... Plasma processing chamber, 8 ... Vacuum exhaust piping, 13 ... Door, 17 ... Processing object, 19 ... Drum jig, 21
...Fixing jig, 23...Head part.

Claims

[Claims for Utility Model Registration] (1) A plasma processing apparatus characterized in that an inner wall of a plasma processing chamber is formed into a substantially spherical shape, and a gas introduction section and a gas discharge section are formed in the plasma processing chamber, respectively. . (2) A large number of small holes are bored in the peripheral wall near the center of the plasma processing chamber, approximating the shape of the inner wall of the plasma processing chamber, and a shower pipe connected to the lower end of the gas introduction pipe is installed to create a gas introduction section. 2. The plasma processing apparatus according to claim 1, wherein the gas exhaust portions are formed by connecting a vacuum evacuation pipe to the inner wall of each of the plasma processing apparatuses. (3) The gas introduction section was constructed by connecting a gas introduction pipe to the inner wall of the plasma processing chamber, and the gas exhaust section was constructed by installing vacuum exhaust piping with a large number of small holes in the peripheral wall near the center. A plasma processing apparatus according to claim 1, characterized in that: (4) The plasma processing apparatus according to claim 3, characterized in that a shower pipe is connected to the tip of the gas introduction pipe. (5) The plasma processing apparatus according to claim 2, characterized in that a head portion having a large number of perforations is formed at the tip of the evacuation piping.