JPH0211158U - - Google Patents
Info
- Publication number
- JPH0211158U JPH0211158U JP8764288U JP8764288U JPH0211158U JP H0211158 U JPH0211158 U JP H0211158U JP 8764288 U JP8764288 U JP 8764288U JP 8764288 U JP8764288 U JP 8764288U JP H0211158 U JPH0211158 U JP H0211158U
- Authority
- JP
- Japan
- Prior art keywords
- microwave chamber
- tube
- microwave
- portion facing
- plasma generation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003779 heat-resistant material Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Description
第１図は本考案装置の模式的縦断面図、第２，
３図は他の実施例を示す模式図である。
１…チユーブ、２…マイクロ波室、３，４…励
磁コイル、５…試料台、１１…ガス供給管部、１
２…プラズマ生成領域、１３…試料配置領域、Ｓ
…試料。
Fig. 1 is a schematic vertical sectional view of the device of the present invention;
FIG. 3 is a schematic diagram showing another embodiment. DESCRIPTION OF SYMBOLS 1...Tube, 2...Microwave chamber, 3, 4...Excitation coil, 5...Sample stage, 11...Gas supply pipe part, 1
2... Plasma generation area, 13... Sample placement area, S
…sample.
Claims (1)
領域を備えた耐熱材製のチユーブを、そのプラズ
マ生成領域がマイクロ波室内に位置するようにし
てこれに貫通させ、前記チユーブのマイクロ波室
内に位置する部分のうち、マイクロ波室へのマイ
クロ波導入口と対向する部分の径は小さく、また
マイクロ波室を経て試料配置領域に向かう部分の
径は大きく設定してあることを特徴とするプラズ
マ装置。 A tube made of a heat-resistant material having a plasma generation region and a sample placement region connected thereto is penetrated through the tube so that the plasma generation region is located within the microwave chamber, and the tube is located within the microwave chamber. A plasma device characterized in that a portion facing a microwave inlet to a microwave chamber has a small diameter, and a portion facing a sample placement area through the microwave chamber has a large diameter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8764288U JPH0211158U (en) | 1988-06-30 | 1988-06-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8764288U JPH0211158U (en) | 1988-06-30 | 1988-06-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0211158U true JPH0211158U (en) | 1990-01-24 |
Family
ID=31312246
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8764288U Pending JPH0211158U (en) | 1988-06-30 | 1988-06-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0211158U (en) |
-
1988
- 1988-06-30 JP JP8764288U patent/JPH0211158U/ja active Pending