JPH01137525U

JPH01137525U -

Info

Publication number: JPH01137525U
Application number: JP3304588U
Authority: JP
Priority date: 1988-03-11
Filing date: 1988-03-11
Publication date: 1989-09-20

Description

[Brief explanation of the drawing]

第１図〜第３図はこの考案の一実施例によるウ
エハ支持治具を示す平面図、側面図および正面図
、第４図は第１図の―線における断面図、第
５図は第１図の―線における断面図、第６図
はこの考案のウエハ支持治具を用いた生成炉の断
面図、第７図〜第９図は従来のウエハ支持治具を
示す平面図、側面図および正面図、第１０図は従
来のウエハ支持治具を用いた生成炉の断面図であ
る。図において、１はウエハ支持棒、２はウエハ支
持溝、３はガス供給板、４は配管、５はガス導入
口、６は半導体ウエハ、８は多孔質板、１０はプ
ロセスチユーブ、１１はヒーター、１２は遮蔽板
、１３はローダーである。なお、図中、同一符号
は同一、または相当部分を示す。 1 to 3 are a plan view, a side view, and a front view showing a wafer support jig according to an embodiment of the invention, FIG. 4 is a cross-sectional view taken along the line -- in FIG. 1, and FIG. 6 is a sectional view of a production furnace using the wafer support jig of this invention, and FIGS. 7 to 9 are plan views, side views, and side views of conventional wafer support jig. The front view and FIG. 10 are cross-sectional views of a production furnace using a conventional wafer support jig. In the figure, 1 is a wafer support rod, 2 is a wafer support groove, 3 is a gas supply plate, 4 is a pipe, 5 is a gas inlet, 6 is a semiconductor wafer, 8 is a porous plate, 10 is a process tube, and 11 is a heater , 12 is a shielding plate, and 13 is a loader. In addition, in the figures, the same reference numerals indicate the same or corresponding parts.

Claims

[Scope of utility model registration request]

A wafer support part that supports a semiconductor wafer; a gas supply plate that is arranged to face the semiconductor wafer supported by the wafer support part and has a hole for releasing gas in a portion facing the semiconductor wafer; and this gas supply plate. A wafer support jig characterized by being equipped with piping for sending gas to.