JPH0246857U - - Google Patents

Info

Publication number
JPH0246857U
JPH0246857U JP12423888U JP12423888U JPH0246857U JP H0246857 U JPH0246857 U JP H0246857U JP 12423888 U JP12423888 U JP 12423888U JP 12423888 U JP12423888 U JP 12423888U JP H0246857 U JPH0246857 U JP H0246857U
Authority
JP
Japan
Prior art keywords
plasma
sample
plasma generation
gas supply
supply pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12423888U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12423888U priority Critical patent/JPH0246857U/ja
Publication of JPH0246857U publication Critical patent/JPH0246857U/ja
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案装置の縦断面図、第2図は第1
図の−線による横断面図、第3図は従来装置
の縦断面図である。 1……プラズマ生成室、2……導波管、3……
試料室、4……励磁コイル、7……試料台、8,
9……ガス供給管、S……試料。
Figure 1 is a longitudinal cross-sectional view of the device of the present invention, and Figure 2 is a cross-sectional view of the device of the present invention.
A cross-sectional view taken along the line - in the figure, and FIG. 3 is a vertical cross-sectional view of the conventional device. 1... Plasma generation chamber, 2... Waveguide, 3...
Sample chamber, 4...Excitation coil, 7...Sample stand, 8,
9...Gas supply pipe, S...Sample.

Claims (1)

【実用新案登録請求の範囲】 電子サイクロトロン共鳴励起によりプラズマ生
成室内で発生させたプラズマを用いて試料に処理
を施すプラズマ装置において、 前記プラズマ生成用の材料ガス供給管を試料の
中心線に対し対称に配置したことを特徴とするプ
ラズマ装置。
[Claims for Utility Model Registration] In a plasma device that processes a sample using plasma generated in a plasma generation chamber by electron cyclotron resonance excitation, the material gas supply pipe for plasma generation is arranged symmetrically with respect to the center line of the sample. A plasma device characterized in that it is arranged in a.
JP12423888U 1988-09-22 1988-09-22 Pending JPH0246857U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12423888U JPH0246857U (en) 1988-09-22 1988-09-22

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12423888U JPH0246857U (en) 1988-09-22 1988-09-22

Publications (1)

Publication Number Publication Date
JPH0246857U true JPH0246857U (en) 1990-03-30

Family

ID=31373797

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12423888U Pending JPH0246857U (en) 1988-09-22 1988-09-22

Country Status (1)

Country Link
JP (1) JPH0246857U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0585380U (en) * 1992-04-20 1993-11-19 株式会社鈴木製作所 Sewing machine needle clamps

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0585380U (en) * 1992-04-20 1993-11-19 株式会社鈴木製作所 Sewing machine needle clamps

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