JPS62188136U - - Google Patents
Info
- Publication number
- JPS62188136U JPS62188136U JP7656186U JP7656186U JPS62188136U JP S62188136 U JPS62188136 U JP S62188136U JP 7656186 U JP7656186 U JP 7656186U JP 7656186 U JP7656186 U JP 7656186U JP S62188136 U JPS62188136 U JP S62188136U
- Authority
- JP
- Japan
- Prior art keywords
- tube
- furnace
- source inlet
- core tube
- wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009792 diffusion process Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Furnace Details (AREA)
Description
第１図は本考案の一実施例を示す炉芯管の概念
的断面図、第２図は従来の炉芯管およびバツフア
を示す概念的断面図。
１……炉芯管外管、２……内管、３……ソース
気体混合室、４……ソース導入口、５……内管開
口部、６，１３……ウエハー、７，１４……ウエ
ハーホルダー、１１……炉芯管、１２……バツフ
ア（石英円筒管）。
FIG. 1 is a conceptual cross-sectional view of a furnace core tube showing an embodiment of the present invention, and FIG. 2 is a conceptual cross-sectional view showing a conventional furnace core tube and buffer. 1... Furnace core outer tube, 2... Inner tube, 3... Source gas mixing chamber, 4... Source inlet, 5... Inner tube opening, 6, 13... Wafer, 7, 14... Wafer holder, 11... Furnace core tube, 12... Buffer (quartz cylindrical tube).
Claims (1)
の内管はソース導入側に気相の昇温・混合を促進
する機構をもち、ウエハー保持部にソース導入口
が偏在しており、開口部の管壁が外側へ湾曲して
いることを特徴とする炉芯管。 The core tube of the diffusion furnace has a double furnace wall, and the inner tube has a mechanism on the source inlet side to promote heating and mixing of the gas phase, and the source inlet is unevenly distributed in the wafer holding part. , a furnace core tube characterized in that the tube wall at the opening is curved outward.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7656186U JPS62188136U (en) | 1986-05-21 | 1986-05-21 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7656186U JPS62188136U (en) | 1986-05-21 | 1986-05-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62188136U true JPS62188136U (en) | 1987-11-30 |
Family
ID=30923757
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7656186U Pending JPS62188136U (en) | 1986-05-21 | 1986-05-21 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62188136U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01270315A (en) * | 1988-04-22 | 1989-10-27 | Fujitsu Ltd | Semiconductor wafer heat-treating device |
-
1986
- 1986-05-21 JP JP7656186U patent/JPS62188136U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01270315A (en) * | 1988-04-22 | 1989-10-27 | Fujitsu Ltd | Semiconductor wafer heat-treating device |