JPS6453757U - - Google Patents
Info
- Publication number
- JPS6453757U JPS6453757U JP14845387U JP14845387U JPS6453757U JP S6453757 U JPS6453757 U JP S6453757U JP 14845387 U JP14845387 U JP 14845387U JP 14845387 U JP14845387 U JP 14845387U JP S6453757 U JPS6453757 U JP S6453757U
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- plasma cvd
- cvd apparatus
- workpiece
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims 2
- 230000000052 comparative effect Effects 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Description
第１図は本考案の一実施例を示す断面図、第２
図は本考案と従来例とにおける成膜速度を示す図
、第３図は比較例を示す断面図、第４図、第５図
は夫々従来例を示す要部断面図である。
図中１は電極、２は外筒、７はワーク、９は高
周波電源、１１はガス導入口、１４はじやま板で
ある。
Fig. 1 is a sectional view showing one embodiment of the present invention;
3 is a cross-sectional view showing a comparative example, and FIGS. 4 and 5 are cross-sectional views of main parts of the conventional example. In the figure, 1 is an electrode, 2 is an outer cylinder, 7 is a workpiece, 9 is a high frequency power source, 11 is a gas inlet, and 14 is a cutting board.
Claims (1)
たワークを配置し、その電極に高周波電源を接続
すると共に、その電極内に膜形成用ガスを導入す
ると共に電極の一方から排気してワークに膜を形
成するプラズマＣＶＤ装置において、上記電極の
排気側に、該電極と同電位のじやま板を設けたこ
とを特徴とするプラズマＣＶＤ装置。 A grounded workpiece is placed inside a cylindrical or parallel plate electrode, a high frequency power source is connected to the electrode, and a film forming gas is introduced into the electrode and exhausted from one side of the electrode to form a film on the workpiece. A plasma CVD apparatus for forming a plasma CVD apparatus, characterized in that a diagonal plate having the same potential as the electrode is provided on the exhaust side of the electrode.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14845387U JPS6453757U (en) | 1987-09-30 | 1987-09-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14845387U JPS6453757U (en) | 1987-09-30 | 1987-09-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6453757U true JPS6453757U (en) | 1989-04-03 |
Family
ID=31419793
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14845387U Pending JPS6453757U (en) | 1987-09-30 | 1987-09-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6453757U (en) |
-
1987
- 1987-09-30 JP JP14845387U patent/JPS6453757U/ja active Pending
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