JPS6449675U - - Google Patents
Info
- Publication number
- JPS6449675U JPS6449675U JP14459887U JP14459887U JPS6449675U JP S6449675 U JPS6449675 U JP S6449675U JP 14459887 U JP14459887 U JP 14459887U JP 14459887 U JP14459887 U JP 14459887U JP S6449675 U JPS6449675 U JP S6449675U
- Authority
- JP
- Japan
- Prior art keywords
- gas
- processing
- mass flow
- flow controller
- piping system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010926 purge Methods 0.000 claims description 3
- 239000007789 gas Substances 0.000 claims 6
- 238000010574 gas phase reaction Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Description
第１図はこの考案の一実施例による真空処理装
置を示す構成図、第２図は従来の真空処理装置を
示す構成図である。
図中、１は処理室、２はロードロツク室、２０
は処理ガス導入端、２３はマスフローコントロー
ラ、２９はパージガス導入配管系、３３は真空処
理装置である。なお、図中、同一符号は同一、又
は相当部分を示す。
FIG. 1 is a block diagram showing a vacuum processing apparatus according to an embodiment of this invention, and FIG. 2 is a block diagram showing a conventional vacuum processing apparatus. In the figure, 1 is a processing chamber, 2 is a load lock chamber, and 20
23 is a mass flow controller, 29 is a purge gas introduction piping system, and 33 is a vacuum processing device. In addition, in the figures, the same reference numerals indicate the same or equivalent parts.
Claims (1)
入し、気相反応を発生せしめる真空処理装置にお
いて、パージガスを処理室とロードロツク室の少
くとも一方に導入する配管系を有すると共に、処
理ガス導入端からマスフローコントローラのガス
導入口までの間において、パージガスを導入する
配管系を接続したことを特徴とする真空処理装置
。 A vacuum processing apparatus that introduces various processing gases into an evacuated processing chamber to generate a gas phase reaction has a piping system that introduces purge gas into at least one of the processing chamber and the load lock chamber, and a processing gas introduction end. A vacuum processing apparatus characterized in that a piping system for introducing purge gas is connected between the gas inlet port of the mass flow controller and the gas inlet port of the mass flow controller.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14459887U JPS6449675U (en) | 1987-09-22 | 1987-09-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14459887U JPS6449675U (en) | 1987-09-22 | 1987-09-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6449675U true JPS6449675U (en) | 1989-03-28 |
Family
ID=31412444
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14459887U Pending JPS6449675U (en) | 1987-09-22 | 1987-09-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6449675U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01225320A (en) * | 1988-03-05 | 1989-09-08 | Tadahiro Omi | Cylinder cabinet piping apparatus |
-
1987
- 1987-09-22 JP JP14459887U patent/JPS6449675U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01225320A (en) * | 1988-03-05 | 1989-09-08 | Tadahiro Omi | Cylinder cabinet piping apparatus |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS6449675U (en) | ||
| JPS645639U (en) | ||
| JPS62180935U (en) | ||
| JPS60140764U (en) | plasma processing equipment | |
| JPS6318834U (en) | ||
| JPS6364767U (en) | ||
| JPS6198868U (en) | ||
| JPH0238468U (en) | ||
| JPH0351834U (en) | ||
| JPH0374665U (en) | ||
| JPH0331U (en) | ||
| JPH0222285U (en) | ||
| JPH0160531U (en) | ||
| JPH01120645U (en) | ||
| JPS6194559U (en) | ||
| JPH0442727U (en) | ||
| JPH0244324U (en) | ||
| JPS60189530U (en) | Heating room exhaust system | |
| JPH01107124U (en) | ||
| JPS6176956U (en) | ||
| JPH0422035U (en) | ||
| JPS61168630U (en) | ||
| JPS6236530U (en) | ||
| JPH01174918U (en) | ||
| JPS6447994U (en) |