JPS5950440U - Microwave plasma processing equipment - Google Patents

Microwave plasma processing equipment

Info

Publication number
JPS5950440U
JPS5950440U JP11346183U JP11346183U JPS5950440U JP S5950440 U JPS5950440 U JP S5950440U JP 11346183 U JP11346183 U JP 11346183U JP 11346183 U JP11346183 U JP 11346183U JP S5950440 U JPS5950440 U JP S5950440U
Authority
JP
Japan
Prior art keywords
plasma processing
microwave plasma
processing equipment
chamber
gas supply
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11346183U
Other languages
Japanese (ja)
Inventor
弘 矢野
糸賀 正直
Original Assignee
富士通株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士通株式会社 filed Critical 富士通株式会社
Priority to JP11346183U priority Critical patent/JPS5950440U/en
Publication of JPS5950440U publication Critical patent/JPS5950440U/en
Pending legal-status Critical Current

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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

図は本考案の一実施例の概略説明図である。 図に於いて、1は処理室、2は排気管、3はガス供給管
、4は蓋板、5は半導体ウェハ、6は空洞室、7はアン
テナ、8.9は磁石である。
The figure is a schematic explanatory diagram of an embodiment of the present invention. In the figure, 1 is a processing chamber, 2 is an exhaust pipe, 3 is a gas supply pipe, 4 is a lid plate, 5 is a semiconductor wafer, 6 is a cavity chamber, 7 is an antenna, and 8.9 is a magnet.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 処理室に取付けられている排気管及びガス供給管が空洞
室を貫通して外部に導出された近傍にそれ等管を取巻く
磁石が設置されてなることを特徴とするマイクロ波プラ
ズマ処理装置。
A microwave plasma processing apparatus characterized in that a magnet surrounding an exhaust pipe and a gas supply pipe attached to a processing chamber is installed near the pipes that pass through a cavity chamber and are led out to the outside.
JP11346183U 1983-07-21 1983-07-21 Microwave plasma processing equipment Pending JPS5950440U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11346183U JPS5950440U (en) 1983-07-21 1983-07-21 Microwave plasma processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11346183U JPS5950440U (en) 1983-07-21 1983-07-21 Microwave plasma processing equipment

Publications (1)

Publication Number Publication Date
JPS5950440U true JPS5950440U (en) 1984-04-03

Family

ID=30262644

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11346183U Pending JPS5950440U (en) 1983-07-21 1983-07-21 Microwave plasma processing equipment

Country Status (1)

Country Link
JP (1) JPS5950440U (en)

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