JPS6013970U - Vapor phase growth equipment - Google Patents

Vapor phase growth equipment

Info

Publication number
JPS6013970U
JPS6013970U JP10206983U JP10206983U JPS6013970U JP S6013970 U JPS6013970 U JP S6013970U JP 10206983 U JP10206983 U JP 10206983U JP 10206983 U JP10206983 U JP 10206983U JP S6013970 U JPS6013970 U JP S6013970U
Authority
JP
Japan
Prior art keywords
vapor phase
phase growth
growth equipment
reaction tube
susceptor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10206983U
Other languages
Japanese (ja)
Other versions
JPS632442Y2 (en
Inventor
健 上條
紘 高野
小沢 晶
正男 小林
Original Assignee
沖電気工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 沖電気工業株式会社 filed Critical 沖電気工業株式会社
Priority to JP10206983U priority Critical patent/JPS6013970U/en
Publication of JPS6013970U publication Critical patent/JPS6013970U/en
Application granted granted Critical
Publication of JPS632442Y2 publication Critical patent/JPS632442Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の気相成長装置の1例の要部を示す説明用
断面図である。第2図は本考案の第1の実施例の要部を
示す説明用断面図である。 1:石英反応管、2:グラファイトサセプタ、3:高周
波コイル、4:ガス導入口、5:真空ポンプ、6:冷却
装置を設けた石英反応管、7:用板状ガス整流装置、8
:冷却水入口、9:冷却水出口。
FIG. 1 is an explanatory cross-sectional view showing essential parts of an example of a conventional vapor phase growth apparatus. FIG. 2 is an explanatory sectional view showing the main parts of the first embodiment of the present invention. 1: Quartz reaction tube, 2: Graphite susceptor, 3: High frequency coil, 4: Gas inlet, 5: Vacuum pump, 6: Quartz reaction tube equipped with cooling device, 7: Plate gas rectifier, 8
: Cooling water inlet, 9: Cooling water outlet.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 縦型気相成長装置において、石英反応管の周囲に冷却装
置を設けるとともに、サセプタ上方で該石英反応管の内
側面にサセプタ方向に傾斜し半径方向に突出するフィン
からなる冷却された中間生成物トラップ用羽根状カス整
流装置を設けたことを特徴とする気相成長装置。
In a vertical vapor phase growth apparatus, a cooling device is provided around the quartz reaction tube, and a cooled intermediate product consisting of fins that are inclined toward the susceptor and protrude in the radial direction on the inner surface of the quartz reaction tube above the susceptor. A vapor phase growth apparatus characterized by being provided with a vane-like waste rectifier for trapping.
JP10206983U 1983-07-02 1983-07-02 Vapor phase growth equipment Granted JPS6013970U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10206983U JPS6013970U (en) 1983-07-02 1983-07-02 Vapor phase growth equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10206983U JPS6013970U (en) 1983-07-02 1983-07-02 Vapor phase growth equipment

Publications (2)

Publication Number Publication Date
JPS6013970U true JPS6013970U (en) 1985-01-30
JPS632442Y2 JPS632442Y2 (en) 1988-01-21

Family

ID=30240761

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10206983U Granted JPS6013970U (en) 1983-07-02 1983-07-02 Vapor phase growth equipment

Country Status (1)

Country Link
JP (1) JPS6013970U (en)

Also Published As

Publication number Publication date
JPS632442Y2 (en) 1988-01-21

Similar Documents

Publication Publication Date Title
JPS6013970U (en) Vapor phase growth equipment
JPS5877043U (en) plasma processing equipment
JPS5853234U (en) Vapor phase growth equipment
JPS60140764U (en) plasma processing equipment
JPS60185331U (en) Vapor phase growth equipment
JPS5945926U (en) chemical vapor deposition equipment
JPS5812941U (en) Susceptor for vapor phase growth equipment
JPS6016757U (en) Chemical vapor deposition equipment
JPS58133932U (en) Compound semiconductor vapor phase growth equipment
JPS60146335U (en) Vapor phase reaction growth equipment
JPS59140435U (en) Vapor phase growth equipment
JPS60140774U (en) Molecular beam epitaxial growth equipment
JPS59131148U (en) Vertical vapor phase growth apparatus
JPS58189533U (en) Susceptor for wafer
JPS6057125U (en) Semiconductor vapor phase growth equipment
JPS5950440U (en) Microwave plasma processing equipment
JPS5885336U (en) Semiconductor vapor phase growth equipment
JPS6120034U (en) Vapor phase growth equipment
JPS6013971U (en) Vapor phase growth equipment
JPS5917759U (en) Cylindrical photoetching device
JPS6018541U (en) Vapor phase growth equipment
JPS59125976U (en) Graphite heating table for thin film growth equipment
JPS60118234U (en) Vapor phase growth equipment
JPS6090831U (en) Semiconductor epitaxial equipment
JPS59179399U (en) Vacuum vessel for fusion equipment