JPS59180426U - semiconductor manufacturing equipment - Google Patents
semiconductor manufacturing equipmentInfo
- Publication number
- JPS59180426U JPS59180426U JP7524283U JP7524283U JPS59180426U JP S59180426 U JPS59180426 U JP S59180426U JP 7524283 U JP7524283 U JP 7524283U JP 7524283 U JP7524283 U JP 7524283U JP S59180426 U JPS59180426 U JP S59180426U
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- semiconductor manufacturing
- manufacturing equipment
- semiconductor
- boat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は従来の平行平板型プラズマエツチング２６
装置の概略断面図である。第２図は従来の円筒型
プラズマエツチング装置の概略横断面図である。
第３図は第２図の装置の概略縦断面図である。第 ′４
図は従莱の円筒型プラズマエツチング装置の欠点につい
て説明するための半導体ウェーハの正面図である。第５
図はこの考案の一実施例の半導体製造装置の概略縦断面
図である。第６図は第５図の装置のＩＶ−ＩＶ線に沿う
横断面図である。
１．０・・・・・・反応管、１１・・曲ガス導入管、１
２・・・・・・ガス排気管、１３．１４・・・・・・円
弧状電極、１５・・・・・・高周波電源、１６・・・・
・・内管、１７・・・・・・ボート、１８・・・・・・
半導体ウェーハ、１９・・・・・・反応ガス（フレオン
ガス）、２２・・・・・・回転軸、２３・・・・・・駆
動源。Figure 1 shows conventional parallel plate plasma etching 26.
FIG. 2 is a schematic cross-sectional view of the device. FIG. 2 is a schematic cross-sectional view of a conventional cylindrical plasma etching apparatus. FIG. 3 is a schematic longitudinal sectional view of the device of FIG. 2; No. '4
The figure is a front view of a semiconductor wafer for explaining the drawbacks of Jourai's cylindrical plasma etching apparatus. Fifth
The figure is a schematic vertical sectional view of a semiconductor manufacturing apparatus according to an embodiment of the invention. FIG. 6 is a cross-sectional view of the device of FIG. 5 taken along line IV--IV. 1.0...Reaction tube, 11...Curved gas introduction tube, 1
2...Gas exhaust pipe, 13.14...Circular electrode, 15...High frequency power supply, 16...
...Inner tube, 17...Boat, 18...
Semiconductor wafer, 19... Reactive gas (Freon gas), 22... Rotating shaft, 23... Drive source.
Claims (1)
持したボートを収容し、反応管内に反応ガスを導入して
、半導体ウェーハにガス処理を施す半導体製造装置にお
いて、 前記ボートの下方に半導体ウェーハを縦面内で回転せし
める回転軸を一部を反応管外に導出して設け、反応管の
外部に回転軸を回転駆動する駆動源を設けたことを特徴
とする半導体製造装置。゛。[Claims for Utility Model Registration] In a semiconductor manufacturing device that accommodates a boat in which a large number of semiconductor wafers are supported in their original state at predetermined intervals in a reaction tube, and performs gas treatment on the semiconductor wafers by introducing a reaction gas into the reaction tube, A rotating shaft for rotating the semiconductor wafer in a vertical plane is provided below the boat, with a part thereof led out of the reaction tube, and a drive source for rotationally driving the rotating shaft is provided outside the reaction tube. Semiconductor manufacturing equipment.゛.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7524283U JPS59180426U (en) | 1983-05-18 | 1983-05-18 | semiconductor manufacturing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7524283U JPS59180426U (en) | 1983-05-18 | 1983-05-18 | semiconductor manufacturing equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS59180426U true JPS59180426U (en) | 1984-12-01 |
Family
ID=30205316
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7524283U Pending JPS59180426U (en) | 1983-05-18 | 1983-05-18 | semiconductor manufacturing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59180426U (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5456376A (en) * | 1977-10-14 | 1979-05-07 | Hitachi Ltd | Object processing unit |
| JPS5497375A (en) * | 1978-01-19 | 1979-08-01 | Nec Corp | Cylindrical plasma processor |
-
1983
- 1983-05-18 JP JP7524283U patent/JPS59180426U/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5456376A (en) * | 1977-10-14 | 1979-05-07 | Hitachi Ltd | Object processing unit |
| JPS5497375A (en) * | 1978-01-19 | 1979-08-01 | Nec Corp | Cylindrical plasma processor |
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