JPS6025750U - Vapor phase growth equipment - Google Patents

Vapor phase growth equipment

Info

Publication number
JPS6025750U
JPS6025750U JP11612683U JP11612683U JPS6025750U JP S6025750 U JPS6025750 U JP S6025750U JP 11612683 U JP11612683 U JP 11612683U JP 11612683 U JP11612683 U JP 11612683U JP S6025750 U JPS6025750 U JP S6025750U
Authority
JP
Japan
Prior art keywords
vapor phase
phase growth
growth equipment
turntable
center
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11612683U
Other languages
Japanese (ja)
Other versions
JPS6138913Y2 (en
Inventor
林　善夫
今井　利郎
Original Assignee
ロ−ム株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ロ−ム株式会社 filed Critical ロ−ム株式会社
Priority to JP11612683U priority Critical patent/JPS6025750U/en
Publication of JPS6025750U publication Critical patent/JPS6025750U/en
Application granted granted Critical
Publication of JPS6138913Y2 publication Critical patent/JPS6138913Y2/ja
Granted legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図及び第２図は従来の気相成長装置の縦断面図及び
Ａ−Ａ断面図、第３図は、本考案に係る気相成長装置の
一実施例を示す縦断面図である。 １・・・ターンテーブル、２・・・インジェクトシール
ド、３・・・支柱、４・・・整流板、５・・・底板、６
・・・回転軸、７・・・反応ガス送り込みパイプ、８・
・・ウェハ、９・・・電極、１０・・・ヒータ、１１・
・・真空容器、１２・・・排気口、１３・・・絶縁物、
１４・・・整流板、１５・・・高周波電源。1 and 2 are a longitudinal sectional view and an AA sectional view of a conventional vapor phase growth apparatus, and FIG. 3 is a longitudinal sectional view showing an embodiment of a vapor phase growth apparatus according to the present invention. 1... Turntable, 2... Inject shield, 3... Support column, 4... Rectifier plate, 5... Bottom plate, 6
... Rotating shaft, 7... Reaction gas feed pipe, 8.
... Wafer, 9... Electrode, 10... Heater, 11.
...Vacuum container, 12...Exhaust port, 13...Insulator,
14... Rectifier plate, 15... High frequency power supply.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] ウェハを塔載したターンテーブルを回転させ、ターンテ
ーブル中央部より反応ガスを噴出させる気相成長装置に
おいて、電極中央部に絶縁物を介して整流板を取り付け
たことを特徴とする気相成長装置。A vapor phase growth apparatus that rotates a turntable on which a wafer is mounted and blows out a reaction gas from the center of the turntable, characterized in that a rectifier plate is attached to the center of the electrode via an insulator. .
JP11612683U 1983-07-25 1983-07-25 Vapor phase growth equipment Granted JPS6025750U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11612683U JPS6025750U (en) 1983-07-25 1983-07-25 Vapor phase growth equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11612683U JPS6025750U (en) 1983-07-25 1983-07-25 Vapor phase growth equipment

Publications (2)

Publication Number Publication Date
JPS6025750U true JPS6025750U (en) 1985-02-21
JPS6138913Y2 JPS6138913Y2 (en) 1986-11-08

Family

ID=30267820

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11612683U Granted JPS6025750U (en) 1983-07-25 1983-07-25 Vapor phase growth equipment

Country Status (1)

Country Link
JP (1) JPS6025750U (en)

Also Published As

Publication number Publication date
JPS6138913Y2 (en) 1986-11-08

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