JPS6096820U - Vapor phase growth nozzle - Google Patents
Vapor phase growth nozzleInfo
- Publication number
- JPS6096820U JPS6096820U JP18954283U JP18954283U JPS6096820U JP S6096820 U JPS6096820 U JP S6096820U JP 18954283 U JP18954283 U JP 18954283U JP 18954283 U JP18954283 U JP 18954283U JP S6096820 U JPS6096820 U JP S6096820U
- Authority
- JP
- Japan
- Prior art keywords
- vapor phase
- phase growth
- nozzle
- growth nozzle
- reaction chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は縦形気相成長装置に従来ノズルを適用した場合
の断面図、第２図ａ、 ｂはそれぞれ従来ノズルの正面
図及びその■−■線断面図、第３図ａ、 ｂはそれぞれ
本考案ノズルの第１実施例の正面図及びその■−■線断
面図、第４図ａ、 ｂはそれぞれ第２実施例の正面図及
びそのＩＶ−ＩＶ線断面図、第５図ａ、 ｂはそれぞれ
第３実施例の正面図及びその■−■線断面図である。
１・・・ウェーハ、２・・・サセプタ、３・・・ワーク
コイル、４ａ〜４ｃ・・・本考案ノズル、５・・・反応
室、７・・・スリット、８・・・支柱、９・・・ツバ、
１ｏ・・・垂直支柱、１１・・・被い板、１２・・・水
平支柱。
寡３副 箋ｑ
目 箋■Figure 1 is a cross-sectional view of a conventional nozzle applied to a vertical vapor phase growth apparatus, Figures 2 a and b are a front view of the conventional nozzle and its cross-sectional view along the line ■-■, and Figures 3 a and b are respectively A front view of the first embodiment of the nozzle of the present invention and a cross-sectional view thereof taken along the line ■-■, FIGS. These are a front view and a sectional view taken along the line ■-■ of the third embodiment, respectively. DESCRIPTION OF SYMBOLS 1... Wafer, 2... Susceptor, 3... Work coil, 4a-4c... Nozzle of this invention, 5... Reaction chamber, 7... Slit, 8... Support column, 9... ··saliva,
1o...Vertical support, 11...Cover plate, 12...Horizontal support. 3rd grade note q item note■
Claims (1)
応室内のサセプタ上に置かれて加熱された半導体ウェー
ハ表面に気相成長膜を生成する装置において、前記気相
成長用ノズルを、被い板を有する筒部分をノズル先端部
とする複数の筒部分と、隣接する筒部分間にスリットを
形成するべ（各筒部分間を連接する複数本の支柱とより
構成した気相成長用ノズル。In an apparatus for supplying raw material gas into a reaction chamber from a vapor phase growth nozzle and producing a vapor phase growth film on the surface of a semiconductor wafer placed on a susceptor in the reaction chamber and heated, the vapor phase growth nozzle is A vapor phase growth nozzle consisting of a plurality of cylindrical parts having a cylindrical plate as the nozzle tip and a slit between adjacent cylindrical parts (a vapor phase growth nozzle consisting of a plurality of columns connecting each cylindrical part) .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18954283U JPS6096820U (en) | 1983-12-07 | 1983-12-07 | Vapor phase growth nozzle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18954283U JPS6096820U (en) | 1983-12-07 | 1983-12-07 | Vapor phase growth nozzle |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6096820U true JPS6096820U (en) | 1985-07-02 |
Family
ID=30408631
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18954283U Pending JPS6096820U (en) | 1983-12-07 | 1983-12-07 | Vapor phase growth nozzle |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6096820U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62171113A (en) * | 1986-01-24 | 1987-07-28 | Toshiba Ceramics Co Ltd | Vertical cvd apparatus |
-
1983
- 1983-12-07 JP JP18954283U patent/JPS6096820U/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62171113A (en) * | 1986-01-24 | 1987-07-28 | Toshiba Ceramics Co Ltd | Vertical cvd apparatus |
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