JPS59212833A - 感光性耐熱材料 - Google Patents

感光性耐熱材料

Info

Publication number
JPS59212833A
JPS59212833A JP8787983A JP8787983A JPS59212833A JP S59212833 A JPS59212833 A JP S59212833A JP 8787983 A JP8787983 A JP 8787983A JP 8787983 A JP8787983 A JP 8787983A JP S59212833 A JPS59212833 A JP S59212833A
Authority
JP
Japan
Prior art keywords
acid
general formula
represented
formula
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8787983A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0159569B2 (de
Inventor
Shigeru Kubota
繁 久保田
Norimoto Moriwaki
森脇　紀元
Torahiko Ando
虎彦 安藤
Shohei Eto
江藤　昌平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP8787983A priority Critical patent/JPS59212833A/ja
Publication of JPS59212833A publication Critical patent/JPS59212833A/ja
Publication of JPH0159569B2 publication Critical patent/JPH0159569B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Formation Of Insulating Films (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP8787983A 1983-05-17 1983-05-17 感光性耐熱材料 Granted JPS59212833A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8787983A JPS59212833A (ja) 1983-05-17 1983-05-17 感光性耐熱材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8787983A JPS59212833A (ja) 1983-05-17 1983-05-17 感光性耐熱材料

Publications (2)

Publication Number Publication Date
JPS59212833A true JPS59212833A (ja) 1984-12-01
JPH0159569B2 JPH0159569B2 (de) 1989-12-18

Family

ID=13927147

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8787983A Granted JPS59212833A (ja) 1983-05-17 1983-05-17 感光性耐熱材料

Country Status (1)

Country Link
JP (1) JPS59212833A (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02311563A (ja) * 1989-05-26 1990-12-27 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた感光性エレメント
US6013414A (en) * 1991-10-25 2000-01-11 International Business Machines Corporation Photosensitive polyimide-precursor formulation

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02311563A (ja) * 1989-05-26 1990-12-27 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた感光性エレメント
US6013414A (en) * 1991-10-25 2000-01-11 International Business Machines Corporation Photosensitive polyimide-precursor formulation

Also Published As

Publication number Publication date
JPH0159569B2 (de) 1989-12-18

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