JPS59155933A - 微細パタ−ン形成方法 - Google Patents

微細パタ−ン形成方法

Info

Publication number
JPS59155933A
JPS59155933A JP58031217A JP3121783A JPS59155933A JP S59155933 A JPS59155933 A JP S59155933A JP 58031217 A JP58031217 A JP 58031217A JP 3121783 A JP3121783 A JP 3121783A JP S59155933 A JPS59155933 A JP S59155933A
Authority
JP
Japan
Prior art keywords
photosensitive resin
resin
organic silicon
silicon compound
etched
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58031217A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6335096B2 (enExample
Inventor
Kuniaki Miyake
邦明 三宅
Masahiro Hatanaka
畑中　正宏
Kyusaku Nishioka
西岡　久作
Wataru Wakamiya
若宮　亙
Masayuki Nakajima
真之 中島
Kenji Takayama
健司 高山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP58031217A priority Critical patent/JPS59155933A/ja
Publication of JPS59155933A publication Critical patent/JPS59155933A/ja
Publication of JPS6335096B2 publication Critical patent/JPS6335096B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58031217A 1983-02-25 1983-02-25 微細パタ−ン形成方法 Granted JPS59155933A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58031217A JPS59155933A (ja) 1983-02-25 1983-02-25 微細パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58031217A JPS59155933A (ja) 1983-02-25 1983-02-25 微細パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS59155933A true JPS59155933A (ja) 1984-09-05
JPS6335096B2 JPS6335096B2 (enExample) 1988-07-13

Family

ID=12325261

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58031217A Granted JPS59155933A (ja) 1983-02-25 1983-02-25 微細パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS59155933A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60214532A (ja) * 1984-04-11 1985-10-26 Nippon Telegr & Teleph Corp <Ntt> パタ−ン形成方法
JPH05211115A (ja) * 1992-10-15 1993-08-20 Oki Electric Ind Co Ltd パターン形成方法
KR100396193B1 (ko) * 2000-03-21 2003-08-27 샤프 가부시키가이샤 패턴의 형성방법

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60214532A (ja) * 1984-04-11 1985-10-26 Nippon Telegr & Teleph Corp <Ntt> パタ−ン形成方法
JPH05211115A (ja) * 1992-10-15 1993-08-20 Oki Electric Ind Co Ltd パターン形成方法
KR100396193B1 (ko) * 2000-03-21 2003-08-27 샤프 가부시키가이샤 패턴의 형성방법

Also Published As

Publication number Publication date
JPS6335096B2 (enExample) 1988-07-13

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